SCHEMBL5081909

SCHEMBL5081909

O=C=C(C(=O)C(F)(F)F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11813888 0.77
SCHEMBL28512600 0.77 TSHR (0.33)
SCHEMBL70056 0.69 CA2 (0.41) CA2
SCHEMBL11818794 0.69 FAAH (0.32)
SCHEMBL11813892 0.67
SCHEMBL16402425 0.63 CA2 (0.37) CA2
SCHEMBL28474554 0.61
SCHEMBL4104149 0.60
SCHEMBL486188 0.60
SCHEMBL5078766 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274334-A1 Dry Etching Gas and Method of Dry Etching NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-11-06 US disclosed
EP-1760769-A1 DRY ETCHING GASES AND METHOD OF DRY ETCHING National Institute of Advanced Industrial Science and Technology (JP) 2007-03-07 EP disclosed