SCHEMBL5085152

SCHEMBL5085152

NCCNCCCC(=O)O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 6/20 0.59
KMT2A Q03164 3/20 0.59
THRB P10828 2/20 0.59
BLM P54132 2/20 0.59
NPSR1 Q6W5P4 2/20 0.59
TSHR P16473 2/20 0.59
GABRR3 A8MPY1 1/20 0.59
GABRP O00591 1/20 0.59
GABRD O14764 1/20 0.59
HDAC3 O15379 1/20 0.59
GABBR2 O75899 1/20 0.59
CYP1A2 P05177 1/20 0.59
GABRA1 P14867 1/20 0.59
GABRB1 P18505 1/20 0.59
GABRG2 P18507 1/20 0.59
GABRR1 P24046 1/20 0.59
GABRB3 P28472 1/20 0.59
GABRR2 P28476 1/20 0.59
SLC6A1 P30531 1/20 0.59
GABRA5 P31644 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5701053 0.98 LMNA (0.56) LMNAKMT2ATHRBBLMNPSR1
SCHEMBL28422205 0.98 LMNA (0.56) LMNAKMT2ATHRBBLMNPSR1
SCHEMBL8775200 0.93 NFKB1 (0.61) LMNAKMT2ATHRBBLMNPSR1
SCHEMBL11439892 0.93 KMT2A (0.64) LMNAKMT2ATHRBBLMNPSR1
Glutarate SCHEMBL2449935 0.92 LMNA (0.62) LMNAKMT2ATHRBBLMNPSR1
Adipic Acid SCHEMBL394243 0.92 NFKB1 (0.67) LMNAKMT2ATHRBBLMNPSR1
Adipic Acid SCHEMBL7530463 0.92 NFKB1 (0.67) LMNAKMT2ATHRBBLMNPSR1
SCHEMBL13154751 0.91 KMT2A (0.61) LMNAKMT2ATHRBBLMNPSR1
SCHEMBL3229942 0.91 LMNA (0.62) LMNAKMT2ATHRBBLMNPSR1
SCHEMBL10438242 0.91 LMNA (0.62) LMNAKMT2ATHRBBLMNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114409864-B Aqueous polyurethane or polyurethane-urea dispersion, method for the production and use thereof 万华化学集团股份有限公司 2023-12-19 CN claimed
CN-115838462-A Preparation method of aqueous polyurethane dispersion 万华化学集团股份有限公司 2023-03-24 CN claimed
CN-105829376-B Method for producing water-emulsifiable polyurethane acrylates 巴斯夫欧洲公司 2020-03-27 CN claimed
US-10294392-B2 Process for preparing water-emulsifiable polyurethane acrylates BASF SE (DE) 2019-05-21 US claimed
EP-3058008-B1 USE OF WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2017-06-14 EP claimed
US-20160251543-A1 PROCESS FOR PREPARING WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2016-09-01 US claimed
EP-3058008-A1 PROCESS FOR PREPARING WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2016-08-24 EP claimed
CN-105829376-A Process for Preparing Water-Emulsifiable Polyurethane Acrylates 巴斯夫欧洲公司 2016-08-03 CN claimed
WO-2015055591-A1 PROCESS FOR PREPARING WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2015-04-23 WO claimed
WO-2008148739-A1 METHOD FOR THE PRODUCTION OF WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2008-12-11 WO claimed
CN-115838462-B Preparation method of aqueous polyurethane dispersion 万华化学集团股份有限公司 2025-04-01 CN disclosed
CN-114409864-B Aqueous polyurethane or polyurethane-urea dispersion, method for the production and use thereof 万华化学集团股份有限公司 2023-12-19 CN disclosed
US-20230374192-A1 AQUEOUS SELF-CROSSLINKABLE POLYURETHANE DISPERSIONS BASF SE (DE) 2023-11-23 US disclosed
EP-4217410-A1 AQUEOUS SELF-CROSSLINKABLE POLYURETHANE DISPERSIONS BASF SE (DE) 2023-08-02 EP disclosed
CN-116323737-A Aqueous self-crosslinkable polyurethane dispersions 巴斯夫欧洲公司 2023-06-23 CN disclosed
WO-2015055591-A1 PROCESS FOR PREPARING WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2015-04-23 WO disclosed
WO-2008148739-A1 METHOD FOR THE PRODUCTION OF WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2008-12-11 WO disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 US disclosed
US-4188221-A REACTION PRODUCT OF (METH)ACRYLIC ACID AND A POLYGLYCIDYL ETHER OF A POLYOL, MOISTURE RESISTANCE TOYO BOSEKI KABUSHIKI KAISHA (JP) 1980-02-12 US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 US disclosed