Hydrochloric Acid

Hydrochloric Acid

SCHEMBL5087095

CCC[P+](C)(C)CCC.[Cl-]

nearest known ligand 0.42

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Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.35
DNM1 Q05193 2/20 0.35
OPRM1 P35372 1/20 0.33
THRB P10828 1/20 0.33
SPHK1 Q9NYA1 1/20 0.32
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31513861 0.96
Iodide SCHEMBL5088138 0.92 TSHR (0.35) TSHRDNM1OPRM1THRBSPHK1
Bromide SCHEMBL5087073 0.92 DNM1 (0.40) TSHRDNM1OPRM1THRBSPHK1
Water SCHEMBL15874181 0.92 TSHR (0.35) TSHRDNM1OPRM1THRBSPHK1
Hydrochloric Acid SCHEMBL31683069 0.85
SCHEMBL29624055 0.80
SCHEMBL31745087 0.79 DNM1 (0.55) TSHRDNM1OPRM1THRBSPHK1
Iodide SCHEMBL31683008 0.77
Water SCHEMBL31683014 0.77
Fluoride Ion SCHEMBL31682999 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080214386-A1 Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-09-04 US disclosed