Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29624055 | 0.96 | — | — | |
| Iodide SCHEMBL31683008 | 0.93 | — | — | |
| Fluoride Ion SCHEMBL31682999 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL31683069 | 0.93 | — | — | |
| Bromide SCHEMBL31683056 | 0.93 | — | — | |
| Water SCHEMBL15874181 | 0.85 | TSHR (0.35) | — | |
| SCHEMBL1718713 | 0.84 | — | — | |
| SCHEMBL31513861 | 0.81 | — | — | |
| Iodide SCHEMBL5088138 | 0.77 | TSHR (0.35) | — | |
| Hydrochloric Acid SCHEMBL5087095 | 0.77 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260071095-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2026-03-12 | — | — | US | disclosed |
| US-20250320381-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250282977-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-09-11 | — | — | US | disclosed |