SCHEMBL5117722

SCHEMBL5117722

Cc1cc([S+](c2ccccc2)c2ccccc2)cc(C)c1OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CA1 P00915 12/20 0.36
CA2 P00918 12/20 0.36
PIK3CD O00329 1/20 0.35
PIK3CA P42336 1/20 0.35
PIK3CB P42338 1/20 0.35
MMP1 P03956 3/20 0.32
MMP2 P08253 3/20 0.32
MMP9 P14780 3/20 0.32
MMP8 P22894 3/20 0.32
MMP13 P45452 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL98592 0.88 HSD11B1 (0.33)
SCHEMBL3779517 0.86 CA1 (0.34) CA1CA2
SCHEMBL3144008 0.83 PTGS1 (0.32) CA1CA2
SCHEMBL548130 0.82 PIK3CD (0.42) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL5857793 0.82 CA2 (0.36) CA1CA2
SCHEMBL3132254 0.82 PTGS1 (0.32) CA1CA2
SCHEMBL3139331 0.82 PTGS1 (0.32) CA1CA2
SCHEMBL1802710 0.81 CA2 (0.43) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL5858639 0.81 CA2 (0.38) CA1CA2MMP1MMP2MMP9
SCHEMBL5856167 0.78 CA1 (0.35) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7396960-B2 Sulfonium salts TOYO GOSEI CO., LTD. (JP) 2008-07-08 US disclosed
US-20070219368-A1 Sulfonium salts TOYO GOSEI CO., LTD. (JP) 2007-09-20 US disclosed
US-7192685-B2 Positive resist composition and method of forming resist pattern using the same. FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed
US-20040197708-A1 Positive resist composition and method of forming resist pattern using the same FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed
EP-1462858-A1 Positive resist composition and method of forming resist pattern using the same Fuji Photo Film Co., Ltd. (JP) 2004-09-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070219368-A1 Sulfonium salts C1S, F12, C1R CA1 421/4885CA2 198/4885PIK3CD 4525/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.