Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 6/20 | 0.71 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.68 |
| ▸ | MEN1 | O00255 | 2/20 | 0.63 |
| ▸ | MAPT | P10636 | 2/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.63 |
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | HTT | P42858 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10445744 | 0.89 | TYR (0.58) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL4055779 | 0.87 | MAPT (0.81) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL278272 | 0.87 | TYR (0.56) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL13788035 | 0.87 | TYR (0.56) | TYRALOX5MEN1MAPTKMT2A | |
| Pyrogallol SCHEMBL10485416 | 0.87 | ALOX5 (0.60) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL29373434 | 0.87 | TYR (0.56) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL278608 | 0.85 | TYR (0.60) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL278523 | 0.85 | MAPT (0.78) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL278775 | 0.84 | TYR (0.68) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL28136966 | 0.84 | TYR (0.58) | TYRALOX5MEN1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| US-7638053-B2 | crosslinked addition-condensation copolymer contains a polyester endcapped with a vinyl polymerized compound such as acrylic acid, methacrylic acid; use in petroleum industry pervaporation technology to reduce energy costs; stability; for separation of aromatic hydrocarbon from aliphatic hydrocarbon | GENERAL ELECTRIC COMPANY (US) | 2009-12-29 | — | — | US | claimed |
| JP-2009517514-A | — | — | 2009-04-30 | — | — | JP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| EP-1957580-A1 | FORMALDEHYDE-FREE PHENOLIC RESIN BINDER. | SAINT-GOBAIN ISOVER (FR) | 2008-08-20 | — | — | EP | claimed |
| WO-2007060237-A1 | FORMALDEHYDE-FREE PHENOLIC RESIN BINDER. | SAINT-GOBAIN ISOVER (FR) | 2007-05-31 | — | — | WO | claimed |
| US-20060289352-A1 | Poly(meth)acrylate membranes for separation of hydrocarbon mixtures | BL TECHNOLOGIES, INC. | 2006-12-28 | — | — | US | claimed |
| US-5369150-A | Resin composition for aqueous paints | KANSAI PAINT CO., LTD. (JP) | 1994-11-29 | — | — | US | claimed |
| EP-0591984-A1 | Resin composition for aqueous paint | KANSAI PAINT CO., LTD. (JP) | 1994-04-13 | — | — | EP | claimed |
| US-5288587-A | Novolaks; improved resolution and heat resistance | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-02-22 | — | — | US | claimed |
| US-5283314-A | Polymerizing an oligomer of a dihydric phenol and a branching agent with a dihydric alcohol and a monohydric phenol with stirring | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1994-02-01 | — | — | US | claimed |
| EP-0567066-A2 | Resin composition for aqueous paints | KANSAI PAINT CO., LTD. (JP) | 1993-10-27 | — | — | EP | claimed |
| US-5041523-A | Interfacial polycondensation using divalent phenol and branching agent | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1991-08-20 | — | — | US | claimed |
| US-4906549-A | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | TOKYO OHKA KOGYO CO., LTD. (JP) | 1990-03-06 | — | — | US | claimed |
| US-4847178-A | Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester | TOKYO OHKA KOGYO CO., LTD. (JP) | 1989-07-11 | — | — | US | claimed |
| US-4600760-A | Thermosettable resin composition containing alkenyl phenyl cyanate | THE DOW CHEMICAL COMPANY (US) | 1986-07-15 | — | — | US | claimed |
| US-4581425-A | WITH AROMATIC POLYCYANATE, POLYMALEIMIDE, AND UNSATURATED AROMATIC MONOMER | THE DOW CHEMICAL COMPANY (US) | 1986-04-08 | — | — | US | claimed |