SCHEMBL278523

SCHEMBL278523

Oc1ccc(Cc2ccc(O)cc2O)cc1

nearest known ligand 0.78

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.78
MEN1 O00255 2/20 0.78
KMT2A Q03164 2/20 0.78
ALOX5 P09917 3/20 0.77
KEAP1 Q14145 1/20 0.63
TYR P14679 4/20 0.60
ESR1 P03372 1/20 0.56
ESR2 Q92731 1/20 0.56
TP53 P04637 1/20 0.46
CYP3A4 P08684 1/20 0.46
ALOX15 P16050 1/20 0.46
TSHR P16473 1/20 0.46
HTT P42858 1/20 0.46
TDP1 Q9NUW8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4055779 0.98 MAPT (0.81) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL4056986 0.91 MAPT (0.72) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL13788030 0.88 MEN1 (0.68) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL875665 0.88 MAPT (0.68) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL875812 0.88 MEN1 (1.00) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL29655583 0.87 ALOX5 (1.00) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL68292 0.87 ALOX5 (1.00) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL29655585 0.87 ALOX5 (1.00) MAPTMEN1KMT2AALOX5KEAP1
SCHEMBL51397 0.85 TYR (0.71) MAPTMEN1KMT2AALOX5TYR
SCHEMBL278524 0.85 MAPT (0.68) MAPTMEN1KMT2AALOX5TYR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
US-5283314-A Polymerizing an oligomer of a dihydric phenol and a branching agent with a dihydric alcohol and a monohydric phenol with stirring IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1994-02-01 US claimed
US-5041523-A Interfacial polycondensation using divalent phenol and branching agent IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1991-08-20 US claimed
US-11254814-B2 Resin composition and molded product obtained therefrom UNITIKA LTD. (JP) 2022-02-22 US disclosed
CN-112218920-B Resin composition and molded article obtained therefrom 尤尼吉可株式会社 2021-10-29 CN disclosed
EP-3896126-A1 RESIN COMPOSITION AND MOLDED BODY OBTAINED FROM SAME Unitika Ltd. (JP) 2021-10-20 EP disclosed
US-11129781-B2 Agent for hair deforming treatment KAO CORPORATION (JP) 2021-09-28 US disclosed
US-20210253848-A1 RESIN COMPOSITION AND MOLDED PRODUCT OBTAINED THEREFROM UNITIKA LTD. (JP) 2021-08-19 US disclosed
US-11045402-B2 Hair cosmetic composition KAO CORPORATION (JP) 2021-06-29 US disclosed
WO-2021085424-A1 RESIN COMPOSITION AND MOLDED BODY OBTAINED FROM SAME ユニチカ株式会社 2021-05-06 WO disclosed
EP-0596129-A1 PHASE DIFFERENCE COMPENSATION FILM IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1994-05-11 EP disclosed
US-5283314-A Polymerizing an oligomer of a dihydric phenol and a branching agent with a dihydric alcohol and a monohydric phenol with stirring IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1994-02-01 US disclosed
US-5104964-A Blow molding IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1992-04-14 US disclosed
US-5041523-A Interfacial polycondensation using divalent phenol and branching agent IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1991-08-20 US disclosed
EP-0387714-A2 Process for production of branched polycarbonate IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1990-09-19 EP disclosed
EP-0362853-A2 Phenoxy resins suitable for vesicular imaging and process for their synthesis JAMES RIVER-GRAPHICS, INC. (US) 1990-04-11 EP disclosed
US-4451550-A BRANCHED ENDCAPPED EPOXY RESIN JAMES RIVER GRAPHICS, INC. (US) 1984-05-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11045402-B2 Hair cosmetic composition CUTA, GRHPR, POLR1C MAPT 2002/4885MEN1 1443/4885KMT2A 519/4885
US-11129781-B2 Agent for hair deforming treatment GRHPR, SLC26A4, COL1A1 MAPT 1209/4885MEN1 1850/4885KMT2A 3198/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.