Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 6/20 | 0.68 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.68 |
| ▸ | MEN1 | O00255 | 2/20 | 0.63 |
| ▸ | MAPT | P10636 | 2/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.63 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.45 |
| ▸ | LTA4H | P09960 | 1/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4055779 | 0.86 | MAPT (0.81) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL278274 | 0.85 | ALOX5 (0.66) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL278523 | 0.84 | MAPT (0.78) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL51397 | 0.84 | TYR (0.71) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL29655585 | 0.81 | ALOX5 (1.00) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL19433107 | 0.81 | TYR (1.00) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL4056986 | 0.81 | MAPT (0.72) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL68292 | 0.81 | ALOX5 (1.00) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL29655583 | 0.81 | ALOX5 (1.00) | TYRALOX5MEN1MAPTKMT2A | |
| SCHEMBL12806929 | 0.80 | TRPA1 (0.53) | TYRALOX5MEN1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11129781-B2 | Agent for hair deforming treatment | KAO CORPORATION (JP) | 2021-09-28 | — | — | US | disclosed |
| US-11045402-B2 | Hair cosmetic composition | KAO CORPORATION (JP) | 2021-06-29 | — | — | US | disclosed |
| US-10959925-B2 | Hair cosmetic composition | KAO CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-3228302-B1 | HAIR DEFORMATION TREATMENT AGENT | KAO CORP (JP) | 2020-09-02 | — | — | EP | disclosed |
| CN-106999382-B | Hair deforming agent | 花王株式会社 | 2020-07-10 | — | — | CN | disclosed |
| CN-106999380-B | Hair deforming agent | 花王株式会社 | 2020-05-05 | — | — | CN | disclosed |
| US-20190290564-A1 | HAIR COSMETIC COMPOSITION | KAO CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |
| US-20190254943-A1 | HAIR COSMETIC COMPOSITION | KAO CORPORATION (JP) | 2019-08-22 | — | — | US | disclosed |
| US-20190224093-A1 | HAIR COSMETIC COMPOSITION | KAO CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| US-20190125052-A1 | METHOD FOR TREATING HAIR | KAO CORPORATION (JP) | 2019-05-02 | — | — | US | disclosed |
| US-20100044888-A1 | BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100044888-A1 | BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7368205-B2 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device | SUMITOMO BAKELITE CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7368205-B2 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device | SUMITOMO BAKELITE CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100044888-A1 | BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT | RARA, AASDHPPT, GABRP | TYR 20/4885ALOX5 2436/4885MEN1 4464/4885 |
| US-11045402-B2 | Hair cosmetic composition | CUTA, GRHPR, POLR1C | TYR 6/4885ALOX5 1994/4885MEN1 1443/4885 |
| US-10959925-B2 | Hair cosmetic composition | CUTA, POLR1C, GRHPR | TYR 4/4885ALOX5 2752/4885MEN1 1687/4885 |
| US-20190254943-A1 | HAIR COSMETIC COMPOSITION | CUTA, POLR1C, GRHPR | TYR 4/4885ALOX5 2752/4885MEN1 1687/4885 |
| US-20190125052-A1 | METHOD FOR TREATING HAIR | GRHPR, TYR, POLR1C | TYR 2/4885ALOX5 2047/4885MEN1 2426/4885 |
| US-20190224093-A1 | HAIR COSMETIC COMPOSITION | CUTA, GRHPR, POLR1C | TYR 6/4885ALOX5 1994/4885MEN1 1443/4885 |
| US-11129781-B2 | Agent for hair deforming treatment | GRHPR, SLC26A4, COL1A1 | TYR 98/4885ALOX5 3694/4885MEN1 1850/4885 |
| US-20190290564-A1 | HAIR COSMETIC COMPOSITION | GRHPR, POLR1C, TYR | TYR 3/4885ALOX5 2006/4885MEN1 1122/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.