SCHEMBL1800748

SCHEMBL1800748

COc1ccc([I+](OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 6/20 0.34
CA2 P00918 6/20 0.34
GAA P10253 1/20 0.34
KMT2A Q03164 1/20 0.34
HSD11B1 P28845 1/20 0.34
HTT P42858 1/20 0.33
NPC1 O15118 1/20 0.33
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33
TSHR P16473 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PPARG P37231 1/20 0.33
NFE2L2 Q16236 1/20 0.33
LTA4H P09960 1/20 0.33
CA4 P22748 1/20 0.33
PIK3CD O00329 1/20 0.32
PIK3CA P42336 1/20 0.32
PIK3CB P42338 1/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1804139 0.99 GAA (0.35) CA1CA2GAAKMT2AHSD11B1
SCHEMBL2922354 0.95 CA2 (0.37) CA1CA2GAAKMT2AHSD11B1
SCHEMBL444424 0.89 CA2 (0.40) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL59304 0.89 CA2 (0.40) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL51423 0.88 CA2 (0.39) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL3284035 0.85 CA2 (0.36) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL361657 0.85 KMT2A (0.40) CA1CA2GAAKMT2AHSD11B1
SCHEMBL1805423 0.84 CA1 (0.35) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL9106447 0.81 MCL1 (0.36) CA1CA2PIK3CDPIK3CAPIK3CB
SCHEMBL2897585 0.81 CA2 (0.39) CA1CA2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8809476-B2 Polymer JSR CORPORATION (JP) 2014-08-19 US disclosed
US-8771923-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2014-07-08 US disclosed
US-20130108962-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2013-05-02 US disclosed
US-8389202-B2 Polymer, radiation-sensitive composition, monomer, and method of producing compound JSR CORPORATION (JP) 2013-03-05 US disclosed
US-20130053526-A1 POLYMER JSR CORPORATION (JP) 2013-02-28 US disclosed
US-8377627-B2 Compound and radiation-sensitive composition JSR CORPORATION (JP) 2013-02-19 US disclosed
US-8361691-B2 Radiation-sensitive composition and process for producing low-molecular compound for use therein JSR CORPORATION (JP) 2013-01-29 US disclosed
US-8334087-B2 Polymer, radiation-sensitive composition, monomer, and method of producing compound JSR CORPORATION (JP) 2012-12-18 US disclosed
US-20120178024-A1 POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND JSR CORPORATION (JP) 2012-07-12 US disclosed
US-8173351-B2 Compound and radiation-sensitive composition JSR CORPORATION (JP) 2012-05-08 US disclosed
US-20090280433-A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN JSR CORPORATION (JP) 2009-11-12 US disclosed
US-20090274977-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2009-11-05 US disclosed
EP-2100870-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION JSR Corporation (JP) 2009-09-16 EP disclosed
EP-2060949-A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN JSR Corporation (JP) 2009-05-20 EP disclosed
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-7258962-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-21 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed
US-20050244747-A1 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090280433-A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN ACP1, PLG, ALG1 CA1 115/4885CA2 1520/4885GAA 319/4885
US-20090274977-A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION RAD51, SLC11A2, XRCC6 CA1 2973/4885CA2 4840/4885GAA 3704/4885
US-20120178024-A1 POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND RAD51, PYM1, MRE11 CA1 1065/4885CA2 2553/4885GAA 4524/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.