Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 19/20 | 0.40 |
| ▸ | CA1 | P00915 | 18/20 | 0.40 |
| ▸ | MMP1 | P03956 | 4/20 | 0.34 |
| ▸ | MMP2 | P08253 | 4/20 | 0.34 |
| ▸ | MMP9 | P14780 | 4/20 | 0.34 |
| ▸ | MMP8 | P22894 | 4/20 | 0.34 |
| ▸ | MMP13 | P45452 | 4/20 | 0.34 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.32 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.32 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL444424 | 1.00 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL51423 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3284035 | 0.93 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1805423 | 0.91 | CA1 (0.35) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1800748 | 0.89 | CA1 (0.34) | CA2CA1PIK3CDPIK3CAPIK3CB | |
| SCHEMBL1804139 | 0.87 | GAA (0.35) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3980025 | 0.87 | CA1 (0.33) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3284975 | 0.86 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3982973 | 0.85 | CA2 (0.32) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL548236 | 0.84 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| CN-122085599-A | Composition, patterning method, formed pattern, semiconductor device and application thereof | — | 2026-05-26 | — | — | CN | disclosed |
| US-10831102-B2 | Photoactive polymer brush materials and EUV patterning using the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-11-10 | — | — | US | disclosed |
| CN-108089404-B | Patterning method of inorganic photoresist composition | 中国科学院理化技术研究所 | 2020-09-18 | — | — | CN | disclosed |
| WO-2019171188-A1 | PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-09-12 | — | — | WO | disclosed |
| US-20050239001-A1 | use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects | HITACHI GLOBAL STORAGE NETHERLANDS B.V. (NL) | 2005-10-27 | — | — | US | disclosed |
| US-20050123852-A1 | Method for patterning a low activation energy photoresist | GLOBALFOUNDRIES U.S. INC. | 2005-06-09 | — | — | US | disclosed |
| US-20050124774-A1 | Low activation energy photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-06-09 | — | — | US | disclosed |
| US-20050112382-A1 | Molecular photoresists containing nonpolymeric silsesquioxanes | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-05-26 | — | — | US | disclosed |