SCHEMBL3284035

SCHEMBL3284035

O=S(=O)(O[I+](c1ccccc1)c1ccc(F)cc1)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CA2 P00918 14/20 0.36
CA1 P00915 13/20 0.36
MMP1 P03956 2/20 0.31
MMP2 P08253 2/20 0.31
MMP9 P14780 2/20 0.31
MMP8 P22894 2/20 0.31
MMP13 P45452 2/20 0.31
PIK3CD O00329 1/20 0.30
PIK3CA P42336 1/20 0.30
PIK3CB P42338 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1805423 0.99 CA1 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL3284975 0.94 CA2 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL59304 0.93 CA2 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL444424 0.93 CA2 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL1801411 0.93 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL51423 0.91 CA2 (0.39) CA2CA1MMP1MMP2MMP9
SCHEMBL4219797 0.86 ACHE (0.36) CA2CA1
SCHEMBL1800748 0.85 CA1 (0.34) CA2CA1PIK3CDPIK3CAPIK3CB
SCHEMBL1804139 0.84 GAA (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL503265 0.84 PKM (0.34) CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7705115-B2 Process for producing radiation-sensitive resin composition JSR CORPORATION (JP) 2010-04-27 US disclosed
US-20090081586-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-03-26 US disclosed
EP-1881371-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-01-23 EP disclosed