SCHEMBL514418

SCHEMBL514418

C1CN2CCCN(C1)CC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20853812 1.00 — —
SCHEMBL513991 1.00 — —
SCHEMBL514401 0.94 CTSL (0.31) —
SCHEMBL20853810 0.94 CTSL (0.31) —
SCHEMBL514300 0.89 ALDH1A1 (0.32) —
SCHEMBL514087 0.89 ALDH1A1 (0.32) —
SCHEMBL11219356 0.89 MGLL (0.31) —
SCHEMBL14433301 0.84 MGLL (0.38) —
SCHEMBL17603026 0.84 MGLL (0.38) —
SCHEMBL8825927 0.84 MGLL (0.38) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10859916-B2 Composition for forming fine pattern and method for forming fine pattern using the same MERCK PATENT GMBH (DE) 2020-12-08 — — US claimed
US-20240036469-A1 METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE MERCK ELECTRONICS LTD. (JP) 2024-02-01 — — US disclosed
EP-4264376-A1 METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE Merck Patent GmbH (DE) 2023-10-25 — — EP disclosed
CN-116635794-A Method for producing thick film resist pattern, thick film solution, and method for producing processed substrate 默克专利有限公司 2023-08-22 — — CN disclosed
WO-2022129015-A1 METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE MERCK PATENT GMBH (DE) 2022-06-23 — — WO disclosed
CN-108780284-B Composition for forming fine pattern and method for forming fine pattern using same AZ电子材料(卢森堡)有限公司 2022-04-12 — — CN disclosed
US-10859916-B2 Composition for forming fine pattern and method for forming fine pattern using the same MERCK PATENT GMBH (DE) 2020-12-08 — — US disclosed
US-10859916-B2 Composition for forming fine pattern and method for forming fine pattern using the same MERCK PATENT GMBH (DE) 2020-12-08 — — US disclosed
EP-3430476-B1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) 2020-04-01 — — EP disclosed
US-20190079398-A1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2019-03-14 — — US disclosed
EP-3430476-A1 COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME AZ Electronic Materials Luxembourg S.à.r.l. (LU) 2019-01-23 — — EP disclosed
US-9849196-B2 Methods and compositions for altering photophysical properties of fluorophores via proximal quenching CORNELL UNIVERSITY (US) 2017-12-26 — — US disclosed
US-9631096-B2 Dye compositions, methods of preparation, conjugates thereof, and methods of use CORNELL UNIVERSITY (US) 2017-04-25 — — US disclosed
US-20160326157-A1 MONOBACTAMS AND METHODS OF THEIR SYNTHESIS AND USE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2016-11-10 — — US disclosed
US-20150328340-A1 METHODS AND COMPOSITIONS FOR ALTERING PHOTOPHYSICAL PROPERTIES OF FLUOROPHORES VIA PROXIMAL QUENCHING CORNELL UNIVERSITY (US) 2015-11-19 — — US disclosed
WO-2015103583-A1 MONOBACTAMS AND METHODS OF THEIR SYNTHESIS AND USE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2015-07-09 — — WO disclosed
US-8945515-B2 Methods and compositions for altering photophysical properties of fluorophores via proximal quenching CORNELL UNIVERSITY (US) 2015-02-03 — — US disclosed
US-20150011731-A1 DYE COMPOSITIONS, METHODS OF PREPARATION, CONJUGATES THEREOF, AND METHODS OF USE CORNELL UNIVERSITY (US) 2015-01-08 — — US disclosed
US-20120027689-A1 METHODS AND COMPOSITIONS FOR ALTERING PHOTOPHYSICAL PROPERITES OF FLUOROPHORES VIA PROXIMAL QUENCHING CORNELL UNIVERSITY (US) 2012-02-02 — — US disclosed
WO-2010096720-A2 METHODS AND COMPOSITIONS FOR ALTERING PHOTOPHYSICAL PROPERTIES OF FLUOROPHORES VIA PROXIMAL QUENCHING CORNELL UNIVERSITY (US) 2010-08-26 — — WO disclosed
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