Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | ELANE | P08246 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 2/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 6/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31097941 | 0.85 | ALOX15 (0.50) | ELANEATMTRPA1ESR1ESR2 | |
| SCHEMBL1520783 | 0.85 | ALOX15 (0.50) | ELANEATMTRPA1ESR1ESR2 | |
| SCHEMBL3192492 | 0.84 | POLB (0.53) | ACHEELANEATMTRPA1KMT2A | |
| SCHEMBL15388633 | 0.84 | ELANE (0.40) | ACHEELANEATMESR1ESR2 | |
| SCHEMBL29497591 | 0.83 | ELANE (0.50) | ELANEATMESR1ESR2THRB | |
| SCHEMBL544758 | 0.83 | ACHE (0.61) | ACHEATMTRPA1ESR1ESR2 | |
| SCHEMBL207636 | 0.83 | ELANE (0.50) | ELANEATMESR1ESR2THRB | |
| SCHEMBL4823898 | 0.82 | ESR1 (0.44) | ACHEELANEESR1ESR2KMT2A | |
| SCHEMBL4947542 | 0.82 | ELANE (0.42) | ELANEATMESR1ESR2THRB | |
| SCHEMBL24106181 | 0.81 | ELANE (0.41) | ELANEATMESR1ESR2THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230059089-A1 | MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-23 | — | — | US | disclosed |
| EP-4116770-A1 | MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-01-11 | — | — | EP | disclosed |
| US-20210389672-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |
| US-20210389669-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-20140065546-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065545-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065546-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065545-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065544-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065544-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-7220529-B2 | Photopolymerizable composition and recording material using the same | FUJIFILM CORPORATION (JP) | 2007-05-22 | — | — | US | disclosed |
| US-20050186504-A1 | Photopolymerizable composition and recording material using the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210389669-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, AFF4 | ACHE 3035/4885ELANE 2166/4885ATM 2792/4885 |
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | RER1, SEM1, REV1 | ACHE 4552/4885ELANE 1402/4885ATM 3734/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | ACHE 3035/4885ELANE 2166/4885ATM 2792/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.