SCHEMBL5145585

SCHEMBL5145585

c1ccc(CC(OB(OC(Cc2ccccc2)(c2ccccc2)c2ccccc2)OC(Cc2ccccc2)(c2ccccc2)c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.48
CYP2C9 P11712 2/20 0.48
CYP2C19 P33261 2/20 0.48
SLC6A2 P23975 1/20 0.40
TAAR1 Q96RJ0 1/20 0.40
KIF11 P52732 3/20 0.39
KCNA5 P22460 1/20 0.38
LMNA P02545 1/20 0.38
CYP2D6 P10635 1/20 0.38
HIF1A Q16665 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ATM Q13315 1/20 0.36
TSHR P16473 1/20 0.36
FDPS P14324 1/20 0.35
CALM1 P0DP23 1/20 0.35
CYP3A4 P08684 2/20 0.34
RECQL P46063 1/20 0.34
TRPA1 O75762 1/20 0.33
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5145593 0.83 CYP1A2 (0.50) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL7001871 0.82 CYP1A2 (0.52) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL238218 0.78 CYP1A2 (0.48) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL11248544 0.78 CYP1A2 (0.48) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL9614595 0.78 CYP1A2 (0.54) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL765190 0.78 CYP1A2 (0.48) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL4454996 0.77 CYP1A2 (0.47) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL8006665 0.75 TAAR1 (0.42) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL23633166 0.74 CYP1A2 (0.44) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1
SCHEMBL11122216 0.74 FDPS (0.44) CYP1A2CYP2C9CYP2C19SLC6A2TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117597368-A Curable composition and cured product 迪睿合株式会社 2024-02-23 CN disclosed
CN-113166415-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-07-23 CN disclosed
CN-113039177-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-25 CN disclosed
CN-112996839-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-06-18 CN disclosed
EP-0899613-B1 Heat processing apparatus and heat developing apparatus using the same FUJIFILM CORP (JP) 2007-10-17 EP disclosed
US-7220529-B2 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2007-05-22 US disclosed
US-20050186504-A1 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. 2005-08-25 US disclosed
US-6919159-B2 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 US disclosed
US-6830861-B2 Photosensitivity; sharp images; high contrast FUJI PHOTO FILM CO., LTD. (JP) 2004-12-14 US disclosed
US-6824953-B2 POLYMERIZABLE COMPOUND HAVING AN ETHYLENIC UNSATURATED BOND, A METHINE DYE, AND A RADICAL GENERATOR THAT INTERACTS WITH THE DYE TO GENERATE A RADICAL FUJI PHOTO FILM CO., LTD. (JP) 2004-11-30 US disclosed
US-6208410-B1 Image forming apparatus FUJI PHOTO FILM CO., LTD. (JP) 2001-03-27 US disclosed
US-6152616-A Heat developing method and apparatus for heat development FUJI PHOTO FILM CO., LTD. (JP) 2000-11-28 US disclosed
US-6096794-A PHOTOINITIATOR SYSTEM FOR PHOTOPOLYMERIZATION OF ETHYLENICALLY UNSATURATED POLYMERIZABLE COMPOUNDS CIBA SPECIALTY CHEMICALS CORPORATION (US) 2000-08-01 US disclosed
US-6090865-A PHOTOINITIATOR SYSTEM COMPRISING (A) AT LEAST ONE O-ALKYLATED AROMATIC NITROGEN-HETEROCYCLE AMINE OXIDE CATION SALT AND (B) AT LEAST ONE ELECTRON DONOR COMPOUND. CIBA SPECIALTY CHEMICALS CORPORATION (US) 2000-07-18 US disclosed
US-6077649-A Heat developing method and apparatus for heat development FUJI PHOTO FILM CO., LTD. (JP) 2000-06-20 US disclosed
US-6022664-A MIXTURE OF A POLYMERIZABLE VINYL MONOMER AND ORGANIC BORATE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 2000-02-08 US disclosed
EP-0899613-A1 Heat processing apparatus and heat developing apparatus using the same Fuji Photo Film Co., Ltd. (JP) 1999-03-03 EP disclosed
EP-0896587-A1 POLYMERISABLE COMPOSITION Ciba SC Holding AG (CH) 1999-02-17 EP disclosed
WO-1997042227-A1 POLYMERISABLE COMPOSITION CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1997-11-13 WO disclosed
EP-0453317-A2 Image forming medium CANON KABUSHIKI KAISHA (JP) 1991-10-23 EP disclosed