Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.50 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | FDPS | P14324 | 1/20 | 0.37 |
| ▸ | KIF11 | P52732 | 3/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.35 |
| ▸ | ARG1 | P05089 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5145585 | 0.83 | CYP1A2 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL9614595 | 0.79 | CYP1A2 (0.54) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL7001871 | 0.79 | CYP1A2 (0.52) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL8006667 | 0.77 | CYP2C19 (0.43) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL238218 | 0.75 | CYP1A2 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL11248544 | 0.75 | CYP1A2 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL765190 | 0.75 | CYP1A2 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL2484068 | 0.74 | CYP1A2 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL4455000 | 0.74 | CYP1A2 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A | |
| SCHEMBL5846769 | 0.74 | CYP2C19 (0.48) | CYP1A2CYP2C9CYP2C19KCNA5HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250122316-A1 | CURABLE COMPOSITION AND CURED PRODUCT | DEXERIALS CORPORATION (JP) | 2025-04-17 | — | — | US | disclosed |
| CN-117597368-A | Curable composition and cured product | 迪睿合株式会社 | 2024-02-23 | — | — | CN | disclosed |
| WO-2023282174-A1 | CURABLE COMPOSITION, AND CURED PRODUCT | デクセリアルズ株式会社 | 2023-01-12 | — | — | WO | disclosed |
| CN-113166415-A | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-07-23 | — | — | CN | disclosed |
| CN-113039177-A | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-06-25 | — | — | CN | disclosed |
| CN-112996839-A | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-06-18 | — | — | CN | disclosed |
| CN-111373326-A | Composition for forming film for lithography, method for forming resist pattern, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2020-07-03 | — | — | CN | disclosed |
| US-10364382-B2 | Curable polysiloxane compositions and pressure sensitive adhesives made therefrom | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2019-07-30 | — | — | US | disclosed |
| EP-2797985-B1 | CURABLE-ON-DEMAND POLYSILOXANE COATING COMPOSITION | 3M INNOVATIVE PROPERTIES CO (US) | 2015-09-23 | — | — | EP | disclosed |
| US-9035008-B2 | Curable-on-demand polysiloxane coating composition | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2015-05-19 | — | — | US | disclosed |
| EP-0899613-A1 | Heat processing apparatus and heat developing apparatus using the same | Fuji Photo Film Co., Ltd. (JP) | 1999-03-03 | — | — | EP | disclosed |
| EP-0896587-A1 | POLYMERISABLE COMPOSITION | Ciba SC Holding AG (CH) | 1999-02-17 | — | — | EP | disclosed |
| WO-1997042227-A1 | POLYMERISABLE COMPOSITION | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 1997-11-13 | — | — | WO | disclosed |
| US-5496696-A | PHOTOSENSITIVE MEDIUM WITH ORGANOBORATE SALT | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-03-05 | — | — | US | disclosed |
| EP-0353030-B1 | Photopolymerization initiator and photosensitive composition employing the same | CANON KK (JP) | 1995-03-15 | — | — | EP | disclosed |
| EP-0587338-A2 | Silver halide imaging materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-03-16 | — | — | EP | disclosed |
| US-5260180-A | Photothermographic imaging media employing silver salts of tetrahydrocarbyl borate anions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| US-5124235-A | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1992-06-23 | — | — | US | disclosed |
| EP-0453317-A2 | Image forming medium | CANON KABUSHIKI KAISHA (JP) | 1991-10-23 | — | — | EP | disclosed |
| EP-0353030-A2 | Photopolymerization initiator and photosensitive composition employing the same | CANON KABUSHIKI KAISHA (JP) | 1990-01-31 | — | — | EP | disclosed |