SCHEMBL5145708

SCHEMBL5145708

N=C(N)NCCCC(NC(=O)OCc1ccccc1)C(=O)O

nearest known ligand 0.59

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 2/20 0.59
SIRT2 Q8IXJ6 2/20 0.59
SIRT1 Q96EB6 1/20 0.59
ITGB3 P05106 2/20 0.58
ITGAV P06756 2/20 0.58
TGM2 P21980 8/20 0.53
CPB1 P15086 1/20 0.52
CPB2 Q96IY4 1/20 0.52
CTSL P07711 2/20 0.52
CTSS P25774 1/20 0.52
SIRT5 Q9NXA8 1/20 0.52
MMP2 P08253 1/20 0.51
MMP9 P14780 1/20 0.51
CAPN1 P07384 1/20 0.50
CAPN2 P17655 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL631840 1.00 FOLH1 (0.59) FOLH1SIRT2SIRT1ITGB3ITGAV
SCHEMBL6768020 1.00 FOLH1 (0.59) FOLH1SIRT2SIRT1ITGB3ITGAV
Water SCHEMBL7266301 0.99 FOLH1 (0.58) FOLH1SIRT2SIRT1ITGB3ITGAV
Hydrochloric Acid SCHEMBL29401494 0.99 FOLH1 (0.58) FOLH1SIRT2SIRT1ITGB3ITGAV
Hydrochloric Acid SCHEMBL333888 0.99 FOLH1 (0.58) FOLH1SIRT2SIRT1ITGB3ITGAV
Water SCHEMBL7274005 0.99 FOLH1 (0.58) FOLH1SIRT2SIRT1ITGB3ITGAV
Hydrochloric Acid SCHEMBL333889 0.99 FOLH1 (0.58) FOLH1SIRT2SIRT1ITGB3ITGAV
Bromide SCHEMBL9221277 0.99 FOLH1 (0.58) FOLH1SIRT2SIRT1ITGB3ITGAV
SCHEMBL11411256 0.96 CTSL (0.56) FOLH1SIRT2SIRT1ITGB3ITGAV
SCHEMBL9500591 0.93 SIRT2 (0.54) FOLH1SIRT2SIRT1ITGB3ITGAV

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5757408-A PRINTING IMAGE ON SUBSTRATE COATED WITH AMINO-ACID DERIVATIVE ADDITIVE; QUICK DRYING OF INK, OPTICAL DENSITY, NONCURLING XEROX CORPORATION (US) 1998-05-26 US claimed
US-5683793-A Ink jet transparencies XEROX CORPORATION (US) 1997-11-04 US claimed
US-5589277-A INK JET PRINTING, AQUEOUS INKS, FAST DRYING XEROX CORPORATION (US) 1996-12-31 US claimed
EP-0667246-A1 Recording sheets containing amino acids, hydroxy acids, and polycarboxyl compounds XEROX CORPORATION (US) 1995-08-16 EP claimed
US-20240399776-A1 COLOR DEVELOPER, THERMAL RECORDING MATERIAL, AND THERMAL RECORDING LAYER COATING MATERIAL SANKO CO., LTD. (JP) 2024-12-05 US disclosed
CN-118005931-A Polymer nano material with metal binding capacity and preparation and application thereof 四川大学 2024-05-10 CN disclosed
CN-118005916-A Modified polyamino acid derivative with conformational regulating capability, preparation and application thereof 四川大学 2024-05-10 CN disclosed
EP-4269119-A1 COLOR DEVELOPER, HEAT-SENSITIVE RECORDING MATERIAL, AND COATING MATERIAL FOR HEAT-SENSITIVE RECORDING LAYERS Sanko Co., Ltd. (JP) 2023-11-01 EP disclosed
WO-2023275410-A1 PEPTIDE SYNTHESIS METHOD INVOLVING STERICALLY HINDERED MIXED ANHYDRIDE INTERMEDIATE AMICOAT AS (NO) 2023-01-05 WO disclosed
WO-2022145400-A1 COLOR DEVELOPER, HEAT-SENSITIVE RECORDING MATERIAL, AND COATING MATERIAL FOR HEAT-SENSITIVE RECORDING LAYERS 三光株式会社 2022-07-07 WO disclosed
EP-3342599-B1 HEAT-SENSITIVE RECORDING MATERIAL SANKO CO LTD (JP) 2021-06-16 EP disclosed
CN-109134778-B Charge inversion type polymer micelle, drug-loaded micelle and preparation method thereof 西南民族大学 2021-03-09 CN disclosed
EP-0245662-B1 P-HYDROXYPHENYLSULFONIUM SALTS AND THEIR USE IN THE PREPARATION OF ESTERS AND AMIDES SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1991-08-07 EP disclosed
US-5034319-A Culture of corynebacterium in a medium of cysteine KYOWA HAKKO KOGYO CO., LTD. (JP) 1991-07-23 US disclosed
EP-0336387-A2 Process for producing L-arginine KYOWA HAKKO KOGYO KABUSHIKI KAISHA (JP) 1989-10-11 EP disclosed
EP-0331988-A1 Sulfonium compounds, as well as process for producing active esters and amides used for the production of amides SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1989-09-13 EP disclosed
US-4857656-A Active esters used for production of esters or amides and process for producing esters or amides SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1989-08-15 US disclosed
EP-0245662-A1 p-Hydroxyphenylsulfonium salts and their use in the preparation of esters and amides SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1987-11-19 EP disclosed
US-4564695-A Process for producing arginyl-p-nitroanilide NITTO BOSEKI CO., LTD. (JP) 1986-01-14 US disclosed
US-4505852-A 7-Amino-4-trifluoromethylquinolone derived substrates and method for determining enzymes and inhibitors ENZYME SYSTEMS PRODUCTS (US) 1985-03-19 US disclosed