SCHEMBL5146143

SCHEMBL5146143

O=C1C=C(c2cccs2)C(=O)O1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGR P06401 1/20 0.40
KDM4E B2RXH2 5/20 0.38
ALDH1A1 P00352 5/20 0.38
HPGD P15428 4/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
MAOB P27338 2/20 0.38
MAPT P10636 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MAOA P21397 1/20 0.37
NPC1 O15118 1/20 0.37
LMNA P02545 1/20 0.37
CASP3 P42574 1/20 0.37
RAB9A P51151 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
F2 P00734 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
LTA4H P09960 1/20 0.36
TYMP P19971 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3216005 0.78 MAPT (0.43) KDM4EALDH1A1HPGDMEN1KMT2A
SCHEMBL3216003 0.78 MAPT (0.43) KDM4EALDH1A1HPGDMEN1KMT2A
SCHEMBL3215993 0.78 MAPT (0.43) KDM4EALDH1A1HPGDMEN1KMT2A
SCHEMBL10745113 0.71 PGR (0.43) PGRKDM4EALDH1A1HPGDMEN1
SCHEMBL10781014 0.71 ALOX15 (0.33) TDP1
SCHEMBL17717551 0.71 ALDH1A1 (0.38) KDM4EALDH1A1HPGDMEN1KMT2A
SCHEMBL17717534 0.70 SLC6A11 (0.42) KDM4EALDH1A1HPGDMEN1KMT2A
SCHEMBL13058839 0.69 PGR (0.39) PGRKDM4EALDH1A1HPGDMEN1
SCHEMBL27591872 0.69 MAOB (0.48) KDM4EALDH1A1HPGDMEN1KMT2A
SCHEMBL28419075 0.68 SLC6A11 (0.41) KDM4EALDH1A1HPGDMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113839095-B Electrolyte and battery comprising same 珠海冠宇电池股份有限公司 2023-07-14 CN disclosed
CN-113839095-A Electrolyte and battery comprising same 珠海冠宇电池股份有限公司 2021-12-24 CN disclosed
EP-1391476-B1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2015-12-09 EP disclosed
US-7312013-B2 Photoreactive composition SEKISUI CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed
US-4140606-A Process for preparing a polymerizable (meth) acrylate oligomer SHOWA DENKO K.K. (JP) 1979-02-20 US disclosed
US-4075167-A MALEIMIDO GROUP-CONTAINING ORGANOSILICON COMPOUNDS DAI NIPPON PRINTING CO., LTD. (JA) 1978-02-21 US disclosed
US-4019904-A INK REPELLENT DAI NIPPON PRINTING COMPANY LIMITED (JA) 1977-04-26 US disclosed
US-4010289-A METHOD OF MANUFACTURING SYNTHETIC RESIN FILM HAVING HIGH WRITABILITY AND PRINTABILITY SHOWA DENKO KABUSHIKI KAISHA (JA) 1977-03-01 US disclosed