Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 8/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | GPR3 | P46089 | 2/20 | 0.40 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.40 |
| ▸ | UQCRB | P14927 | 1/20 | 0.40 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | RORA | P35398 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3136704 | 1.00 | HSD11B1 (0.41) | HSD11B1ALDH1A1GPR3HSD17B3UQCRB | |
| Trifluoromethanesulfonic Acid SCHEMBL36543 | 0.93 | ALDH1A1 (0.46) | HSD11B1ALDH1A1GPR3HSD17B3UQCRB | |
| SCHEMBL29745785 | 0.92 | HSD11B1 (0.40) | HSD11B1ALDH1A1HSD17B3UQCRBHSD17B2 | |
| SCHEMBL2437122 | 0.92 | HSD11B1 (0.40) | HSD11B1ALDH1A1HSD17B3UQCRBHSD17B2 | |
| SCHEMBL2438820 | 0.89 | HSD11B1 (0.38) | HSD11B1ALDH1A1HSD17B3UQCRBHSD17B2 | |
| SCHEMBL2435494 | 0.89 | HSD11B1 (0.38) | HSD11B1ALDH1A1HSD17B3UQCRBHSD17B2 | |
| SCHEMBL7578509 | 0.88 | ALDH1A1 (0.44) | HSD11B1ALDH1A1HSD17B3UQCRBHSD17B2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6118365 | 0.88 | GPR3 (0.48) | HSD11B1GPR3PTPN1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL1261243 | 0.87 | ALDH1A1 (0.43) | HSD11B1ALDH1A1GPR3NPC1RAB9A | |
| Trifluoromethanesulfonic Acid SCHEMBL3134851 | 0.87 | ALDH1A1 (0.43) | HSD11B1ALDH1A1GPR3NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1396 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| CN-111138810-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-113929906-B | Self-crosslinkable isocyanurate polymer and anti-reflection coating composition, preparation method thereof and pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2023-07-04 | — | — | CN | claimed |
| US-20230119934-A1 | NETWORK POLYMERS AND METHODS OF MAKING AND USING SAME | UNIV COLORADO REGENTS (US) | 2023-04-20 | — | — | US | claimed |
| US-11535713-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2022-12-27 | — | — | US | claimed |
| US-20220371266-A1 | LIGHT PATTERNING OF SILICA NANOCAGE MATERIALS | CORNELL UNIVERSITY | 2022-11-24 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-20020160301-A1 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| WO-2002054136-A2 | A TINTED, HIGH DK OPHTHALMIC MOLDING AND A METHOD FOR MAKING SAME | NOVARTIS AG (CH) | 2002-07-11 | — | — | WO | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-6063542-A | Polymer for positive photoresist and chemical amplification positive photoresist composition comprising the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2000-05-16 | — | — | US | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| US-5962185-A | Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-10-05 | — | — | US | claimed |
| US-5962186-A | Polymer for chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-10-05 | — | — | US | claimed |
| US-5882835-A | Positive photoresist resin and chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-03-16 | — | — | US | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |