Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | VNN1 | O95497 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | RORC | P51449 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL515371 | 0.99 | TDP1 (0.39) | TDP1KMT2AMEN1VNN1ATM | |
| Trifluoromethanesulfonic Acid SCHEMBL515772 | 0.88 | TDP1 (0.43) | TDP1KMT2AMEN1VNN1ATM | |
| Trifluoromethanesulfonic Acid SCHEMBL31603622 | 0.88 | TDP1 (0.43) | TDP1KMT2AMEN1VNN1ATM | |
| SCHEMBL3879944 | 0.84 | PTPN1 (0.38) | TDP1KMT2AMEN1ALDH1A1HPGD | |
| SCHEMBL3877031 | 0.83 | PTPN1 (0.39) | TDP1KMT2AMEN1ALDH1A1HPGD | |
| SCHEMBL3167925 | 0.81 | TDP1 (0.56) | TDP1KMT2AMEN1ATMALDH1A1 | |
| SCHEMBL2945652 | 0.80 | CA2 (0.39) | CA2 | |
| SCHEMBL2923123 | 0.78 | CA2 (0.37) | CA2 | |
| SCHEMBL4191335 | 0.77 | CA2 (0.34) | TDP1KMT2AMEN1HPGDSMN1; SMN2 | |
| SCHEMBL7530996 | 0.77 | CA2 (0.36) | CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9720322-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9477149-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2016-10-25 | — | — | US | disclosed |
| US-9229323-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9046765-B2 | Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film | JSR CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20150004545-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20140255854-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8758978-B2 | Radiation-sensitive resin composition, resist pattern formation method, and polymer | JSR CORPORATION (JP) | 2014-06-24 | — | — | US | disclosed |
| US-20140023968-A1 | RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | JSR CORPORATION (JP) | 2014-01-23 | — | — | US | disclosed |
| US-20130337385-A1 | NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION | JSR CORPORATION (JP) | 2013-12-19 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20050095527-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-6838225-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| US-20040146802-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-29 | — | — | US | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| US-20020132181-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-09-19 | — | — | US | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | RARA, H1-0, NR2E3 | TDP1 4425/4885KMT2A 364/4885MEN1 1310/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.