Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29724586 | 1.00 | LIMK1 (0.34) | LIMK1CD44 | |
| SCHEMBL9507986 | 0.77 | ALDH1A1 (0.38) | CD44 | |
| SCHEMBL6538170 | 0.75 | LIMK1 (0.31) | LIMK1 | |
| SCHEMBL9770711 | 0.74 | CD44 (0.33) | LIMK1CD44 | |
| SCHEMBL6538512 | 0.72 | — | — | |
| SCHEMBL6537985 | 0.72 | — | — | |
| SCHEMBL6538565 | 0.71 | — | — | |
| SCHEMBL9770642 | 0.71 | LIMK1 (0.30) | LIMK1 | |
| SCHEMBL25692553 | 0.71 | THRB (0.38) | — | |
| SCHEMBL25693570 | 0.71 | LMNA (0.38) | LIMK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11899364-B2 | Photosensitive polyimide compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-02-13 | — | — | US | claimed |
| US-11782344-B2 | Photosensitive polyimide compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2023-10-10 | — | — | US | claimed |
| EP-3286605-B1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2023-06-28 | — | — | EP | claimed |
| EP-3286606-B1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2022-12-28 | — | — | EP | claimed |
| CN-108027563-B | Photosensitive polyimide composition | 富士胶片电子材料美国有限公司 | 2021-12-03 | — | — | CN | claimed |
| US-20200218152-A1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2020-07-09 | — | — | US | claimed |
| US-20190171105-A1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-06-06 | — | — | US | claimed |
| US-10036952-B2 | Photosensitive polyimide compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2018-07-31 | — | — | US | claimed |
| US-20160313641-A1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2016-10-27 | — | — | US | claimed |
| US-20160313642-A1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2016-10-27 | — | — | US | claimed |
| US-4987261-A | Diaminoindane derivatives | MITSUI TOATSU CHEMICALS, INC. (JP) | 1991-01-22 | — | — | US | claimed |
| US-20250188223-A1 | POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250189892-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250188311-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250188312-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20020182536-A1 | Polyimides and polyamic acids | MITSUI CHEMICALS, INC. (JP) | 2002-12-05 | — | — | US | disclosed |
| EP-1225192-A1 | POLYIMIDES AND POLYAMIC ACIDS | Mitsui Chemicals, Inc. (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-5367095-A | Polyamine compounds containing secondary amino substituents and compositions containing such compounds | NIPPON PAINT COMPANY, LTD. (JP) | 1994-11-22 | — | — | US | disclosed |
| EP-0499206-A2 | Polyamine compositions containing secondary amine functions | NIPPON PAINT CO., LTD. (JP) | 1992-08-19 | — | — | EP | disclosed |
| US-4987261-A | Diaminoindane derivatives | MITSUI TOATSU CHEMICALS, INC. (JP) | 1991-01-22 | — | — | US | disclosed |