SCHEMBL685946

SCHEMBL685946

C[S+](C)C1CCCCC1=O

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.50
CA2 P00918 4/20 0.50
CA4 P22748 4/20 0.50
KMT2A Q03164 1/20 0.48
KDM4E B2RXH2 1/20 0.34
HSD17B10 Q99714 1/20 0.34
MCL1 Q07820 1/20 0.33
MAPK1 P28482 1/20 0.33
HTT P42858 1/20 0.33
MAPT P10636 1/20 0.32
TLR4 O00206 1/20 0.31
CA6 P23280 3/20 0.31
NPC1 O15118 1/20 0.30
GAA P10253 1/20 0.30
RAB9A P51151 1/20 0.30
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8171348 0.92 CA1 (0.43) CA1CA2CA4KMT2AKDM4E
SCHEMBL3210568 0.86 CA1 (0.50) CA1CA2CA4KMT2AKDM4E
Trifluoromethanesulfonic Acid SCHEMBL515932 0.82 CA1 (0.40) CA1CA2CA4KMT2AKDM4E
Trifluoromethanesulfonic Acid SCHEMBL1078830 0.82 CA1 (0.36) CA1CA2CA4KMT2AKDM4E
SCHEMBL686204 0.80 CA1 (0.45) CA1CA2CA4KMT2AMCL1
SCHEMBL244365 0.79 KMT2A (0.47) CA1CA2CA4KMT2AKDM4E
SCHEMBL2183584 0.76 CA1 (0.45) CA1CA2CA4KMT2AKDM4E
SCHEMBL685962 0.74 KMT2A (0.42) CA1CA2CA4KMT2A
SCHEMBL686215 0.73 MCL1 (0.44) CA1CA2CA4KMT2AKDM4E
SCHEMBL686045 0.73 KMT2A (0.45) CA1CA2CA4KMT2AMCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 175 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1669421-B1 Ink composition for a color filter, a color filter substrate manufactured using the ink composition and method of manufacturing a color filter substrate using the ink composition SAMSUNG ELECTRONICS CO LTD (KR) 2007-07-18 EP claimed
JP-2007507580-A 2007-03-29 JP claimed
US-7122294-B2 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-10-17 US claimed
US-7078444-B2 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-07-18 US claimed
EP-1625447-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M Innovative Properties Company (US) 2006-02-15 EP claimed
US-20050158655-A1 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2005-07-21 US claimed
US-6841333-B2 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2005-01-11 US claimed
WO-2004107051-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-12-09 WO claimed
US-20040234888-A1 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY 2004-11-25 US claimed
US-20040087690-A1 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2004-05-06 US claimed
CN-118459372-A Preparation method of photoacid generator sulfonate for ARF photoresist 常州朗芯新材料科技有限公司 2024-08-09 CN disclosed
US-20190196328-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2019-06-27 US disclosed
US-9880472-B2 Pattern formation method, pattern, and etching method, electronic device manufacturing method, and electronic device using same FUJIFILM CORPORATION (JP) 2018-01-30 US disclosed
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD TOYO GOSEI CO., LTD. (JP) 2018-01-11 US disclosed
EP-2891014-B1 PATTERN FORMING METHOD, AND ELECTRONIC DEVICE PRODUCING METHOD USING THE SAME FUJIFILM CORP (JP) 2017-11-29 EP disclosed
WO-2004042473-A2 IONIC PHOTOACID GENERATORS WITH SEGMENTED HYDROCARBON-FLUOROCARBON SULFONATE ANIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-05-21 WO disclosed
US-20040087690-A1 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2004-05-06 US disclosed
EP-1398339-A1 POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2004-03-17 EP disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed
US-20030170561-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-09-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD ASIC1, ASIC3, CRY1 CA1 72/4885CA2 27/4885CA4 276/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.