SCHEMBL516406

SCHEMBL516406

CCCCCN(CC)CCCCC

nearest known ligand 0.54

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 13/20 0.54
DNM1 Q05193 3/20 0.50
PLA2G1B P04054 1/20 0.46
PLA2G2A P14555 1/20 0.46
TSHR P16473 1/20 0.44
THRB P10828 1/20 0.44
KDM5A P29375 1/20 0.44
KDM4C Q9H3R0 1/20 0.44
CHRM2 P08172 1/20 0.41
HTR1A P08908 1/20 0.41
ADRA2A P08913 1/20 0.41
CHRM1 P11229 1/20 0.41
DRD1 P21728 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
ADRA1A P35348 1/20 0.41
OPRM1 P35372 1/20 0.41
DRD3 P35462 1/20 0.41
SLC6A3 Q01959 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8957984 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL11336824 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL15993932 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL23767403 0.97 KCNH2 (0.52) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL8750284 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL25341537 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
Hydrochloric Acid SCHEMBL5439092 0.97 DNM1 (0.52) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL4251988 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL9852686 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR
SCHEMBL11338420 0.97 KCNH2 (0.57) KCNH2DNM1PLA2G1BPLA2G2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 649 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111971116-B Dispersant composition, coloring composition and color filter 大塚化学株式会社 2022-06-28 CN claimed
US-11021499-B2 Bis(6-methyl-3-sulphophenyl)(2-methylphenyl)phosphine, ammonium salt thereof, and method for producing same KURARAY CO., LTD. (JP) 2021-06-01 US claimed
US-10696701-B2 Bis(6-methyl-3-sulphophenyl)phenylphosphine, ammonium salt thereof, and method for producing same KURARAY CO., LTD. (JP) 2020-06-30 US claimed
US-20190071460-A1 BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME HONDA ERIKO (JP) 2019-03-07 US claimed
EP-2980093-B1 BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME KURARAY CO (JP) 2019-01-09 EP claimed
US-20180141967-A1 BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME KURARAY CO., LTD. (JP) 2018-05-24 US claimed
EP-2980092-B1 BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME KURARAY CO (JP) 2017-10-04 EP claimed
US-20160052948-A1 BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME KURARAY CO., LTD. (JP) 2016-02-25 US claimed
US-20160052947-A1 BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME KURARAY CO., LTD. (JP) 2016-02-25 US claimed
EP-2980093-A1 BIS(6-METHYL-3-SULPHOPHENYL)(2-METHYLPHENYL)PHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME Kuraray Co., Ltd. (JP) 2016-02-03 EP claimed
EP-2980092-A1 BIS(6-METHYL-3-SULPHOPHENYL)PHENYLPHOSPHINE, AMMONIUM SALT THEREOF, AND METHOD FOR PRODUCING SAME Kuraray Co., Ltd. (JP) 2016-02-03 EP claimed
US-20260147276-A1 NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-05-28 US disclosed
US-12624016-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-05-12 US disclosed
US-12619145-B2 Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-05-05 US disclosed
US-20260118758-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-04-30 US disclosed
WO-1988003148-A2 HETEROAROMATIC DERIVATIVES OF ADENOSIDE WARNER-LAMBERT COMPANY (US) 1988-05-05 WO disclosed
US-4649204-A ANTIDEPRESSANTS MCNEILAB, INC. (US) 1987-03-10 US disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed
EP-0167019-A1 Diaryl-ethylamino derivatives BAYER AG (DE) 1986-01-08 EP disclosed
EP-0167019-A1 Diaryl-ethylamino derivatives BAYER AG (DE) 1986-01-08 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12619145-B2 Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern MSR1, H1-4, ARG1 KCNH2 1134/4885DNM1 2294/4885PLA2G1B 3401/4885
US-20260147276-A1 NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RFC1, RFC2, RFC4 KCNH2 2560/4885DNM1 1075/4885PLA2G1B 2549/4885
US-20260118758-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, MSR1, CBR1 KCNH2 832/4885DNM1 1366/4885PLA2G1B 3494/4885
US-12624016-B2 Salt, acid generator, resist composition and method for producing resist pattern CLIC4, SCO2, H1-0 KCNH2 155/4885DNM1 1645/4885PLA2G1B 2970/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.