SCHEMBL5165332

SCHEMBL5165332

CCOC(=O)C(C)N1C(=O)C=CC1=O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 1/20 0.50
GSK3B P49841 1/20 0.50
ALDH1A1 P00352 8/20 0.47
HPGD P15428 4/20 0.47
NPSR1 Q6W5P4 4/20 0.47
HTT P42858 2/20 0.47
HSP90AA1 P07900 1/20 0.47
CACNA1B Q00975 1/20 0.47
APBA1 Q02410 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
CYP1A2 P05177 2/20 0.43
CYP2C19 P33261 2/20 0.43
BLM P54132 1/20 0.43
WRN Q14191 1/20 0.43
HIF1A Q16665 1/20 0.43
MAPT P10636 3/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
TSHR P16473 2/20 0.40
LMNA P02545 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15394244 0.86 ALDH1A1 (0.40) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL5160610 0.85 LMNA (0.42) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL14868134 0.83 ALDH1A1 (0.38) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL3874765 0.83 ALDH1A1 (0.55) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL15023988 0.82 ALDH1A1 (0.39) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL5166313 0.82 ESR1 (0.42) ALDH1A1HPGDNPSR1HTTTDP1
SCHEMBL3001374 0.82 ALDH1A1 (0.42) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL14868136 0.81 ALDH1A1 (0.37) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL14868142 0.81 ALDH1A1 (0.37) GSK3AGSK3BALDH1A1HPGDNPSR1
SCHEMBL14868135 0.81 ALDH1A1 (0.37) GSK3AGSK3BALDH1A1HPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110941142-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-05-25 CN disclosed
CN-110941142-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2020-03-31 CN disclosed
CN-106104381-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2019-12-13 CN disclosed
EP-1582548-B1 PROCESS FOR PRODUCING POLYMERIZABLE POLYBRANCHED POLYESTER DAINIPPON INK & CHEMICALS (JP) 2007-03-28 EP disclosed
US-7141642-B2 Process for producing polymerizable polybranched polyester DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-11-28 US disclosed
US-20060047140-A1 Process for producing polymerizable polybranched polyester DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-03-02 US disclosed
EP-1582548-A1 PROCESS FOR PRODUCING POLYMERIZABLE POLYBRANCHED POLYESTER DAINIPPON INK AND CHEMICALS, INC. (JP) 2005-10-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060047140-A1 Process for producing polymerizable polybranched polyester ACSL4, ACSL1, HACL2 GSK3A 2879/4885GSK3B 3375/4885ALDH1A1 1751/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.