Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNMT1 | P26358 | 1/20 | 0.43 |
| ▸ | ERCC1 | P07992 | 2/20 | 0.38 |
| ▸ | FEN1 | P39748 | 2/20 | 0.38 |
| ▸ | ERCC4 | Q92889 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | MEN1 | O00255 | 4/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | PRKCA | P17252 | 1/20 | 0.35 |
| ▸ | NSD2 | O96028 | 1/20 | 0.35 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.35 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL567138 | 0.87 | DNMT1 (0.50) | DNMT1ERCC1FEN1ERCC4MAPT | |
| SCHEMBL43564 | 0.85 | DNMT1 (0.49) | DNMT1ERCC1FEN1ERCC4MAPT | |
| SCHEMBL65123 | 0.83 | TSHR (0.44) | DNMT1ERCC1FEN1ERCC4MAPT | |
| SCHEMBL3144814 | 0.79 | ALDH1A1 (0.48) | DNMT1MAPTCYP1A2TDP1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL52114 | 0.78 | ERCC1 (0.46) | ERCC1FEN1ERCC4MAPTTSHR | |
| SCHEMBL336529 | 0.77 | DNMT1 (0.45) | DNMT1MAPTTSHRCES1CYP1A2 | |
| Phenanthrene SCHEMBL28237114 | 0.77 | ALDH1A1 (0.52) | MAPTTSHRCYP1A2POLBTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6306910 | 0.76 | DNMT1 (0.44) | DNMT1MAPTTSHRCES1CYP1A2 | |
| Trifluoromethanesulfonic Acid SCHEMBL51719 | 0.75 | ERCC1 (0.71) | DNMT1ERCC1FEN1ERCC4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL28266656 | 0.74 | DNMT1 (0.41) | DNMT1MAPTCES1CYP1A2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 812 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115981100-B | Hydrofluoric acid-resistant protective material for lithography and lithography process thereof | 湖南梵鑫新材料股份有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-20260008909-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA INC (US) | 2026-01-08 | — | — | US | claimed |
| US-20250208517-A1 | ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY | BREWER SCIENCE, INC. | 2025-06-26 | — | — | US | claimed |
| WO-2025137444-A1 | ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY | BREWER SCIENCE, INC. (US) | 2025-06-26 | — | — | WO | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| CN-119414657-A | Fluorine-containing titanium oxide nanoparticle photoresist material, preparation method thereof and application thereof in photoetching technology | 山东大学 | 2025-02-11 | — | — | CN | claimed |
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | claimed |
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| CN-113671793-B | Chemical amplification type positive ultraviolet photoresist and preparation and use methods thereof | 徐州博康信息化学品有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-111045296-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-12-27 | — | — | CN | claimed |
| US-20150241783-A1 | Methods and Techniques to use with Photosensitized Chemically Amplified Resist Chemicals and Processes | TOKYO ELECTRON LIMITED (JP) | 2015-08-27 | — | — | US | claimed |
| US-20150241782-A1 | Chemical Amplification Methods and Techniques for Developable Bottom Anti-reflective Coatings and Dyed Implant Resists | TOKYO ELECTRON LIMITED (JP) | 2015-08-27 | — | — | US | claimed |
| US-20150234272-A1 | METAL OXIDE NANOPARTICLES AND PHOTORESIST COMPOSITIONS | INTEL CORPORATION (US) | 2015-08-20 | — | — | US | claimed |
| US-20150160551-A1 | POSITIVE-TONE, CHEMICALLY AMPLIFIED, AQUEOUS-DEVELOPABLE, PERMANENT DIELECTRIC | GEORGIA TECH RESEARCH CORPORATION (US) | 2015-06-11 | — | — | US | claimed |
| US-20150152328-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | MERCK PATENT GMBH (DE) | 2015-06-04 | — | — | US | claimed |
| EP-2856519-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | Merck Patent GmbH (DE) | 2015-04-08 | — | — | EP | claimed |
| US-20150037735-A1 | MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF | INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) | 2015-02-05 | — | — | US | claimed |
| WO-2013182265-A1 | PHOTOACTIVATED ETCHING PASTE AND ITS USE | MERCK PATENT GMBH (DE) | 2013-12-12 | — | — | WO | claimed |
| US-20130264287-A1 | GRAFTED MEMBRANES AND SUBSTRATES HAVING SURFACES WITH SWITCHABLE SUPEROLEOPHILICITY AND SUPEROLEOPHOBICITY AND APPLICATIONS THEREOF | KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (SA) | 2013-10-10 | — | — | US | claimed |
| US-20120187287-A1 | Substrate compositions and methods of use thereof | NEXTVAL, INC. | 2012-07-26 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150037735-A1 | MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF | ETV6, ETV1, ESR1 | DNMT1 659/4885ERCC1 397/4885FEN1 4059/4885 |
| US-20260008909-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | CD47, LCP1, DEGS1 | DNMT1 707/4885ERCC1 217/4885FEN1 3139/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.