Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERCC1 | P07992 | 2/20 | 0.46 |
| ▸ | FEN1 | P39748 | 2/20 | 0.46 |
| ▸ | ERCC4 | Q92889 | 2/20 | 0.46 |
| ▸ | RNASEH1 | O60930 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | POLB | P06746 | 4/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CASP3 | P42574 | 1/20 | 0.38 |
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.38 |
| ▸ | MEN1 | O00255 | 5/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | CASP1 | P29466 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | CA9 | Q16790 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL7134477 | 0.90 | TSHR (0.50) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL51719 | 0.84 | ERCC1 (0.71) | ERCC1FEN1ERCC4MAPTPOLB | |
| SCHEMBL66140 | 0.82 | ERCC1 (0.50) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| SCHEMBL29361703 | 0.81 | ERCC1 (0.62) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| SCHEMBL710689 | 0.81 | ERCC1 (0.62) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| SCHEMBL1410 | 0.81 | ERCC1 (0.62) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| SCHEMBL2824834 | 0.79 | ERCC1 (0.60) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| Water SCHEMBL4444794 | 0.79 | ERCC1 (0.60) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| Ammonia Solution, Strong SCHEMBL8656352 | 0.79 | ERCC1 (0.60) | ERCC1FEN1ERCC4RNASEH1MAPT | |
| SCHEMBL1279494 | 0.79 | ERCC1 (0.60) | ERCC1FEN1ERCC4RNASEH1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 531 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3084522-B1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING THE SAME | MERCK PATENT GMBH (DE) | 2020-09-09 | — | — | EP | claimed |
| CN-105849636-B | Underlayer composition for promoting self-assembly and methods of making and using | AZ电子材料卢森堡有限公司 | 2019-09-27 | — | — | CN | claimed |
| EP-3049449-B1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2019-01-09 | — | — | EP | claimed |
| EP-3084522-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2016-10-26 | — | — | EP | claimed |
| EP-3049449-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2016-08-03 | — | — | EP | claimed |
| US-9181449-B2 | Underlayer composition for promoting self assembly and method of making and using | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-11-10 | — | — | US | claimed |
| US-9093263-B2 | Underlayer composition for promoting self assembly and method of making and using | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-07-28 | — | — | US | claimed |
| US-20150166821-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) | 2015-06-18 | — | — | US | claimed |
| US-20150093912-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2015-04-02 | — | — | US | claimed |
| WO-2015044215-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-04-02 | — | — | WO | claimed |
| CN-102768467-A | Sensitizer for chemical amplification type positive photoresist and application thereof in preparation of chemical amplification type positive photoresist | CHINESE ACAD TECH INST PHYSICS | 2012-11-07 | — | — | CN | claimed |
| CN-102768466-A | Chemical amplification type positive photoresist, preparation method and application thereof in two-photon fine processing | CHINESE ACAD TECH INST PHYSICS | 2012-11-07 | — | — | CN | claimed |
| EP-1732937-A1 | COMPOUND FOR OPTICAL MATERIALS AND METHODS OF FABRICATION | General Electric Company (US) | 2006-12-20 | — | — | EP | claimed |
| US-20060183055-A1 | Method for defining a feature on a substrate | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | claimed |
| EP-1691410-A2 | Method for defining a feature on a substrate | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | claimed |
| WO-2005097843-A1 | COMPOUND FOR OPTICAL MATERIALS AND METHODS OF FABRICATION | GENERAL ELECTRIC COMPANY (US) | 2005-10-20 | — | — | WO | claimed |
| US-20050214479-A1 | Compound for optical materials and methods of fabrication | MOMENTIVE PERFORMANCE MATERIALS INC. | 2005-09-29 | — | — | US | claimed |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| US-5972560-A | A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050214479-A1 | Compound for optical materials and methods of fabrication | AFF2, AFF1, ELOVL6 | ERCC1 1300/4885FEN1 1529/4885ERCC4 1002/4885 |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | ERCC1 583/4885FEN1 268/4885ERCC4 1259/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.