SCHEMBL5178783

SCHEMBL5178783

COc1cc2cc3ccccc3cc2c(S(=O)(=O)O)c1OC.c1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
KDM4E B2RXH2 1/20 0.40
HPGD P15428 1/20 0.40
NQO1 P15559 1/20 0.39
MAPT P10636 1/20 0.38
SLC2A1 P11166 1/20 0.38
HTR1A P08908 1/20 0.36
ABCG2 Q9UNQ0 2/20 0.36
ABCB1 P08183 1/20 0.36
KAT6A Q92794 1/20 0.35
EGFR P00533 1/20 0.35
TUBB4A P04350 3/20 0.35
TUBB P07437 3/20 0.35
TUBA3C P0DPH7 3/20 0.35
TUBA1B P68363 3/20 0.35
TUBA4A P68366 3/20 0.35
TUBB4B P68371 3/20 0.35
TUBB3 Q13509 3/20 0.35
TUBB2A Q13885 3/20 0.35
TUBB8 Q3ZCM7 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4238902 0.91 NQO1 (0.46) ALDH1A1KDM4EHPGDNQO1MAPT
Biphenyl SCHEMBL5178781 0.88 HPGD (0.41) ALDH1A1KDM4EHPGDNQO1MAPT
SCHEMBL5365236 0.82 SLC2A1 (0.42) KDM4ESLC2A1NPC1SMN1; SMN2L3MBTL1
SCHEMBL5950594 0.80 NQO1 (0.46) ALDH1A1KDM4EHPGDNQO1MAPT
SCHEMBL2220772 0.78 MAPK9 (0.39) ALDH1A1KDM4EHPGDMAPTTUBB4A
SCHEMBL2220777 0.77 PDGFRB (0.47) ALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL4878845 0.77 NQO1 (0.45) ALDH1A1KDM4EHPGDNQO1MAPT
SCHEMBL7190294 0.75 RAB9A (0.46) ALDH1A1KDM4EMAPTNPC1SMN1; SMN2
SCHEMBL4880032 0.73 NQO1 (0.39) ALDH1A1KDM4EHPGDNQO1MAPT
SCHEMBL7594312 0.71 SLC2A1 (0.37) KDM4ESLC2A1NPC1SMN1; SMN2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1089129-B1 Positive type photosensitive resin composition, process for producing pattern and electronic parts HITACHI CHEM DUPONT MICROSYS (JP) 2007-06-13 EP disclosed
US-6436593-B1 A POLYIMIDE PRECURSOR OR A POLYOXAZOLE PRECURSOR HAVING A GROUP REPRESENTED BY--OR, ACID GENERATION WITH RADIATION HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2002-08-20 US disclosed
EP-1089129-A1 Positive type photosensitive resin composition, process for producing pattern and electronic parts Hitachi Chemical DuPont MicroSystems Ltd. (JP) 2001-04-04 EP disclosed