SCHEMBL5190192

SCHEMBL5190192

COC1(N(C)C)C=CC(C(=O)c2ccccc2)=CC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.41
NPC1 O15118 1/20 0.41
HPGD P15428 1/20 0.41
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.34
POLB P06746 1/20 0.34
ELANE P08246 2/20 0.33
PTGS1 P23219 1/20 0.33
PTGS2 P35354 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
ATM Q13315 1/20 0.33
ACHE P22303 2/20 0.33
MAPT P10636 2/20 0.33
MEN1 O00255 1/20 0.33
PLA2G1B P04054 1/20 0.33
HTT P42858 1/20 0.33
KMT2A Q03164 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29080583 0.88 RAB9A (0.37) RAB9ANPC1HPGDALDH1A1POLB
SCHEMBL27706754 0.82 PPARG (0.38) ALDH1A1TSHRCYP2D6CYP2C19MAPT
SCHEMBL210845 0.81 ALDH1A1 (0.38) RAB9ANPC1HPGDALDH1A1TSHR
SCHEMBL3643054 0.80 ALDH1A1 (0.37) RAB9ANPC1HPGDALDH1A1TSHR
SCHEMBL27903354 0.80 ALDH1A1 (0.37) RAB9ANPC1HPGDALDH1A1TSHR
SCHEMBL157514 0.80 HPGD (0.41) RAB9ANPC1HPGDALDH1A1ELANE
SCHEMBL27506088 0.79 ALDH1A1 (0.36) RAB9ANPC1HPGDALDH1A1TSHR
SCHEMBL3041974 0.79 ALDH1A1 (0.36) RAB9ANPC1HPGDALDH1A1TSHR
SCHEMBL8574305 0.79 ALDH1A1 (0.36) RAB9ANPC1HPGDALDH1A1TSHR
SCHEMBL27823388 0.77 RAB9A (0.39) RAB9ANPC1HPGDALDH1A1PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 416 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113341647-B Dry film resist composition and dry film resist laminate 杭州福斯特电子材料有限公司 2024-05-28 CN claimed
CN-117687268-B Photosensitive resin composition, photosensitive dry film and copper-clad plate 湖南初源新材料股份有限公司 2024-04-19 CN claimed
CN-117687268-A Photosensitive resin composition, photosensitive dry film and copper-clad plate 湖南初源新材料股份有限公司 2024-03-12 CN claimed
CN-117008417-A Photosensitive resin composition, resist material and application 杭州福斯特电子材料有限公司 2023-11-07 CN claimed
CN-116560189-A Photocurable resin composition and application thereof 杭州福斯特电子材料有限公司 2023-08-08 CN claimed
CN-116184763-A Photocurable resin composition and application thereof 杭州福斯特电子材料有限公司 2023-05-30 CN claimed
CN-110471256-B Photosensitive resin composition 杭州福斯特电子材料有限公司 2023-05-12 CN claimed
CN-113801291-B Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB 杭州福斯特电子材料有限公司 2023-05-12 CN claimed
CN-114660895-A Dry film resist, photosensitive dry film and copper-clad plate 杭州福斯特电子材料有限公司 2022-06-24 CN claimed
CN-110488570-B Photosensitive resin composition and application thereof 浙江福斯特新材料研究院有限公司 2022-03-11 CN claimed
CN-108490737-B Photosensitive resin composition and application thereof 杭州福斯特电子材料有限公司 2021-11-02 CN claimed
CN-113341647-A Dry film resist composition and dry film resist laminate 浙江福斯特新材料研究院有限公司 2021-09-03 CN claimed
CN-107219726-B Resin composition and application 浙江福斯特新材料研究院有限公司 2020-07-28 CN claimed
CN-101189553-A Conductive lithographic polymer and method of making devices using same INTEL CORP (US) 2008-05-28 CN claimed
CN-1384399-A Photoresist composition HIPRAY CORP (US) 2002-12-11 CN claimed
US-20260132311-A1 PHOTOCURABLE ADHESIVE COMPOSITION AND CURED ADHESIVE FORMED THEREFROM UNIV OF MASSACHUSETTS (US) 2026-05-14 US disclosed
CN-113621274-B Pigment dispersion composition for black matrix and pigment dispersion photoresist composition for black matrix 阪田油墨股份有限公司 2024-07-05 CN disclosed
US-4885229-A CONTAINING ACRYLATED ESTERS 501 DAICEL CHEMICAL INDUSTRIES LTD. (JP) 1989-12-05 US disclosed
CN-1035005-A Has the photohardenable static printing grand master pattern that improves the reverse transfer and the electrical property that disappears DU PONT (US) 1989-08-23 CN disclosed
EP-0321618-A1 Photosensitive hardenable compositions DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1989-06-28 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260132311-A1 PHOTOCURABLE ADHESIVE COMPOSITION AND CURED ADHESIVE FORMED THEREFROM CD44, CDH1, PTK2 RAB9A 4387/4885NPC1 4866/4885HPGD 4610/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.