Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.46 |
| ▸ | NPC1 | O15118 | 3/20 | 0.46 |
| ▸ | RAB9A | P51151 | 3/20 | 0.46 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.46 |
| ▸ | KDM1A | O60341 | 1/20 | 0.39 |
| ▸ | BRD4 | O60885 | 1/20 | 0.38 |
| ▸ | NQO2 | P16083 | 1/20 | 0.36 |
| ▸ | PSMB5 | P28074 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.34 |
| ▸ | APP | P05067 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | PDE3B | Q13370 | 1/20 | 0.34 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.34 |
| ▸ | BCHE | P06276 | 1/20 | 0.34 |
| ▸ | SNCA | P37840 | 1/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.33 |
| ▸ | TERT | O14746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9274306 | 0.93 | L3MBTL1 (0.51) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| Sulfuric Acid SCHEMBL944025 | 0.89 | NPC1 (0.50) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| Sulfuric Acid SCHEMBL864635 | 0.84 | APAF1 (0.50) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| SCHEMBL12107916 | 0.83 | NPC1 (0.60) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| Hydrochloric Acid SCHEMBL11156397 | 0.83 | NPC1 (0.60) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| SCHEMBL12908903 | 0.82 | NPC1 (0.42) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| Hydrochloric Acid SCHEMBL519644 | 0.81 | NPC1 (0.56) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| SCHEMBL9279444 | 0.81 | NPC1 (0.56) | L3MBTL1NPC1RAB9ANLRP3KDM1A | |
| Sulfuric Acid SCHEMBL519200 | 0.81 | ALDH1A1 (0.42) | L3MBTL1BRD4ALDH1A1GAASNCA | |
| Sulfuric Acid SCHEMBL16728394 | 0.81 | APAF1 (0.48) | L3MBTL1NPC1RAB9ANLRP3KDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0598763-B1 | ACID BATH FOR THE GALVANIC DEPOSITION OF COPPER, AND THE USE OF SUCH A BATH | ATOTECH DEUTSCHLAND GMBH (DE) | 1995-12-13 | — | — | EP | claimed |
| EP-4018790-A1 | MANUFACTURING SEQUENCES FOR HIGH DENSITY INTERCONNECT PRINTED CIRCUIT BOARDS AND A HIGH DENSITY INTERCONNECT PRINTED CIRCUIT BOARD | Atotech Deutschland GmbH & Co. KG (DE) | 2022-06-29 | — | — | EP | disclosed |
| US-10982343-B2 | Plating compositions for electrolytic copper deposition, its use and a method for electrolytically depositing a copper or copper alloy layer onto at least one surface of a substrate | ATOTECH DEUTSCHLAND GMBH (DE) | 2021-04-20 | — | — | US | disclosed |
| US-20200347504-A1 | PLATING COMPOSITIONS FOR ELECTROLYTIC COPPER DEPOSITION, ITS USE AND A METHOD FOR ELECTROLYTICALLY DEPOSITING A COPPER OR COPPER ALLOY LAYER ONTO AT LEAST ONE SURFACE OF A SUBSTRATE | ATOTECH DEUTSCHLAND GMBH (DE) | 2020-11-05 | — | — | US | disclosed |
| EP-3483307-B1 | PLATING COMPOSITIONS FOR ELECTROLYTIC COPPER DEPOSITION, ITS USE AND A METHOD FOR ELECTROLYTICALLY DEPOSITING A COPPER OR COPPER ALLOY LAYER ONTO AT LEAST ONE SURFACE OF A SUBSTRATE | ATOTECH DEUTSCHLAND GMBH (DE) | 2020-04-01 | — | — | EP | disclosed |
| EP-3483307-A1 | PLATING COMPOSITIONS FOR ELECTROLYTIC COPPER DEPOSITION, ITS USE AND A METHOD FOR ELECTROLYTICALLY DEPOSITING A COPPER OR COPPER ALLOY LAYER ONTO AT LEAST ONE SURFACE OF A SUBSTRATE | ATOTECH Deutschland GmbH (DE) | 2019-05-15 | — | — | EP | disclosed |
| EP-2619244-B1 | IMPROVED METHOD OF PRODUCING POLYMERIC PHENAZONIUM COMPOUNDS | MACDERMID ACUMEN INC (US) | 2018-11-14 | — | — | EP | disclosed |
| US-9040700-B2 | Method of producing polymeric phenazonium compounds | CITIBANK, N.A. | 2015-05-26 | — | — | US | disclosed |
| US-20140163198-A1 | Method of Producing Polymeric Phenazonium Compounds | MACDERMID ACUMEN, INC. (US) | 2014-06-12 | — | — | US | disclosed |
| US-8735580-B2 | Method of producing polymeric phenazonium compounds | CITIBANK, N.A. | 2014-05-27 | — | — | US | disclosed |
| CN-103038397-A | Method for electrodepositing chip-to-chip, chip-to-wafer, and wafer-to-wafer copper interconnects in Through Silicon Vias (TSVs) by heating the substrate and cooling the electrolyte | ATOTECH DEUTSCHLAND GMBH | 2013-04-10 | — | — | CN | disclosed |
| US-20120073981-A1 | Method of Producing Polymeric Phenazonium Compounds | CITIBANK, N.A. | 2012-03-29 | — | — | US | disclosed |
| US-20120077956-A1 | Method of Producing Polymeric Phenazonium Compounds | CITIBANK, N.A. | 2012-03-29 | — | — | US | disclosed |
| WO-2012040417-A1 | IMPROVED METHOD OF PRODUCING POLYMERIC PHENAZONIUM COMPOUNDS | MACDERMID ACUMEN, INC. (US) | 2012-03-29 | — | — | WO | disclosed |
| US-20120024713-A1 | PROCESS FOR ELECTRODEPOSITION OF COPPER CHIP TO CHIP, CHIP TO WAFER AND WAFER TO WAFER INTERCONNECTS IN THROUGH-SILICON VIAS (TSV) WITH HEATED SUBSTRATE AND COOLED ELECTROLYTE | ATOTECH DEUTSCHLAND GMBH (DE) | 2012-02-02 | — | — | US | disclosed |
| CN-102318041-A | PROCESS FOR ELECTRODEPOSITION OF COPPER CHIP TO CHIP, CHIP TO WAFER AND WAFER TO WAFER INTERCONNECTS IN THROUGH-SILICON VIAS (TSV) | ATOTECH DEUTSCHLAND GMBH | 2012-01-11 | — | — | CN | disclosed |
| US-6881671-B2 | Process for depositing metal contacts on a buried grid solar cell and solar cell obtained by the process | IPU, INSTITUTTET FOR PRODUKTUDVIKLING (DK) | 2005-04-19 | — | — | US | disclosed |
| US-20030172969-A1 | Process for depositing metal contacts on a buried grid solar cell and solar cell obtained by the process | BP ALTERNATIVE ENERGY INTERNATIONAL LIMITED (GB) | 2003-09-18 | — | — | US | disclosed |
| EP-1182709-A1 | A process for depositing metal contacts on a buried grid solar cell and a solar cell obtained by the process | IPU, Instituttet For Produktudvikling (DK) | 2002-02-27 | — | — | EP | disclosed |
| WO-2002015282-A1 | A PROCESS FOR DEPOSITING METAL CONTACTS ON A BURIED GRID SOLAR CELL AND A SOLAR CELL OBTAINED BY THE PROCESS | IPU, INSTITUTTET FOR PRODUKTUDVIKLING (DK) | 2002-02-21 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120073981-A1 | Method of Producing Polymeric Phenazonium Compounds | NOX5, PRMT5, CHRM5 | L3MBTL1 4184/4885NPC1 4874/4885RAB9A 1380/4885 |
| US-20140163198-A1 | Method of Producing Polymeric Phenazonium Compounds | NOX5, PRMT5, H1-5 | L3MBTL1 4161/4885NPC1 4882/4885RAB9A 1573/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.