Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11911862 | 0.93 | PKM (0.33) | THRBPKMGRIN2DGRIN3BGRIN1 | |
| SCHEMBL14695704 | 0.87 | TSHR (0.40) | THRBGRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL2688294 | 0.87 | PKM (0.45) | THRBPKM | |
| SCHEMBL12390023 | 0.86 | — | — | |
| SCHEMBL871816 | 0.84 | GRIN2D (0.36) | THRBGAAGRIN2DGRIN3BGRIN1 | |
| SCHEMBL7457431 | 0.82 | DPP4 (0.31) | — | |
| SCHEMBL14695900 | 0.82 | GRIN2D (0.52) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL14695530 | 0.82 | GRIN2D (0.52) | PKMGAAGRIN2DGRIN3BGRIN1 | |
| SCHEMBL9987665 | 0.80 | ALDH1A1 (0.46) | THRBPKMGAA | |
| SCHEMBL14695901 | 0.79 | GRIN2D (0.37) | PKMGAAGRIN2DGRIN3BGRIN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180180996-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180181003-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20170351179-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170349686-A1 | PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170351179-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170322490-A1 | PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170199460-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170199461-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-7271297-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-09-18 | — | — | US | disclosed |
| EP-1826196-A2 | Vinyl ether compounds | Daicel Chemical Industries, Ltd. (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20060205957-A1 | Process for producing vinyl ether compounds | ISHII YASUTAKA | 2006-09-14 | — | — | US | disclosed |
| US-7078562-B2 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-07-18 | — | — | US | disclosed |
| US-7074970-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-11 | — | — | US | disclosed |
| US-20050158662-A1 | Adamantane derivatives and resin compositions using the same as raw material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-07-21 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-20020016516-A1 | Hydrocarbon bonded to a carbon atom which is bonded to a hydroxyl group, a methane group, and an adamantane ring; or its protected derivatives; alcohol intermediates for acrylic ester monomers for hydrophilic, adhesive photoresists | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-6344590-B1 | HYDROCARBON BONDED TO A CARBON ATOM WHICH IS BONDED TO A HYDROXYL GROUP, A METHANE GROUP, AND AN ADAMANTANE RING; OR ITS PROTECTED DERIVATIVES; ALCOHOL INTERMEDIATES FOR ACRYLIC ESTER MONOMERS FOR HYDROPHILIC, ADHESIVE PHOTORESISTS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-02-05 | — | — | US | disclosed |
| EP-0990632-A1 | ADAMANTANEMETHANOL DERIVATIVES AND PROCESS FOR THE PREPARATION THEREOF | Daicel Chemical Industries, Ltd. (JP) | 2000-04-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060205957-A1 | Process for producing vinyl ether compounds | ETV6, CYP3A4, SUV39H2 | THRB 1429/4885PKM 1297/4885GAA 4365/4885 |
| US-20020016516-A1 | Hydrocarbon bonded to a carbon atom which is bonded to a hydroxyl group, a methane group, and an adamantane ring; or its protected derivatives; alcohol intermediates for acrylic ester monomers for hydrophilic, adhesive photoresists | ADH1A, ADGRF1, ADGRE5 | THRB 2084/4885PKM 4544/4885GAA 3995/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.