SCHEMBL5196378

SCHEMBL5196378

CCC(Cl)CC(=O)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5196470 0.82 CHRM1 (0.34)
SCHEMBL5195983 0.79 CA2 (0.41)
SCHEMBL5194608 0.77 GPR84 (0.40)
SCHEMBL5195699 0.76 GPR84 (0.43)
SCHEMBL5196418 0.76 GPR84 (0.43)
SCHEMBL5194178 0.76 GPR84 (0.43)
SCHEMBL5197793 0.76 GPR84 (0.43)
SCHEMBL5194291 0.75 HSD11B1 (0.32)
SCHEMBL9964632 0.75 TSHR (0.32)
SCHEMBL9215751 0.74 TDP1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1403260-B1 Optically active epoxy compounds and processes for their production TOSOH CORP (JP) 2007-08-08 EP disclosed
US-7169944-B2 Optically active epoxy compounds and processes for their production TOSOH CORPORATION (JP) 2007-01-30 US disclosed
US-20040063979-A1 Optically active epoxy compounds and processes for their production TOSOH CORPORATION (JP) 2004-04-01 US disclosed
EP-1403260-A2 Optically active epoxy compounds and processes for their production Tosoh Corporation (JP) 2004-03-31 EP disclosed