SCHEMBL51973

SCHEMBL51973

CN1C=CC(c2ccccc2)=CC1

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.34
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
SLC22A2 O15244 1/20 0.31
SLC22A1 O15245 1/20 0.31
SLC22A3 O75751 1/20 0.31
SLC6A4 P31645 1/20 0.31
MAPT P10636 2/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HRH4 Q9H3N8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL27794969 0.98 KMT2A (0.33) KMT2ANPC1RAB9ASLC22A2SLC22A1
Iodide SCHEMBL28487528 0.98 KMT2A (0.33) KMT2ANPC1RAB9ASLC22A2SLC22A1
SCHEMBL9095823 0.82 GAA (0.42) KMT2AMAPTMAPK1SMN1; SMN2ALDH1A1
Iodide SCHEMBL28651393 0.81 GAA (0.41) KMT2AMAPTMAPK1SMN1; SMN2ALDH1A1
SCHEMBL29811019 0.81 GAA (0.41) KMT2AMAPTMAPK1SMN1; SMN2ALDH1A1
Hydrochloric Acid SCHEMBL31376364 0.81 GAA (0.41) KMT2AMAPTMAPK1SMN1; SMN2ALDH1A1
SCHEMBL30462670 0.78 L3MBTL1 (0.43) KMT2AMAPTALDH1A1
SCHEMBL27605532 0.77 ALDH1A1 (0.33) KMT2AALDH1A1
SCHEMBL28311090 0.77 DRD2 (0.38) KMT2ANPC1RAB9AMAPTMAPK1
SCHEMBL21181464 0.77 NISCH (0.39) SMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2450 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 CN claimed
US-20250147425-A1 STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2025-05-08 US claimed
CN-119937261-A Release agent composition and method of forming pattern using the same 三星显示有限公司 2025-05-06 CN claimed
CN-119838022-A Amatoxin conjugates containing branched linkers 杭州多禧生物科技有限公司 2025-04-18 CN claimed
CN-113423430-B Amatoxin conjugates containing branched linkers 杭州多禧生物科技有限公司 2024-12-03 CN claimed
CN-118010462-A Method for simultaneously measuring content of 1-methyl-4-phenylpyridine and metformin in OCTs inhibition experiment and application thereof 南京药明康德新药开发有限公司 2024-05-10 CN claimed
WO-2024085293-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT 영창케미칼 주식회사 2024-04-25 WO claimed
CN-116782937-A anti-PD-1 antibodies and uses thereof 优特力克斯有限公司 2023-09-19 CN claimed
US-9796800-B2 Process for producing polydienes BRIDGESTONE CORPORATION (JP) 2017-10-24 US claimed
US-20160108153-A1 PROCESS FOR PRODUCING POLYDIENES BRIDGESTONE CORPORATION (JP) 2016-04-21 US claimed
US-9249244-B2 Process for producing polydienes BRIDGESTONE CORPORATION (JP) 2016-02-02 US claimed
US-20130108610-A1 Inhibition of Microbial Growth by Aconitase Inhibition THE PROCTER & GAMBLE COMPANY 2013-05-02 US claimed
CN-102181449-A Construction and applications of cell model expressing human organic cation transporter-1 UNIV ZHEJIANG 2011-09-14 CN claimed
CN-1886362-B Preparation and use of alkylating agents QUEENS MEDICAL CT 2010-10-13 CN claimed
US-6232326-B1 SUFFICIENT TO REDUCE DOPAMINE LEVELS IN SUBCORTICAL AREAS OF THE BRAIN WITHOUT CAUSING SYMPTOMS OF PARKINSON'S DISEASE; PERMANENT OR LONG-TERM AMELIORATION OF SYMPTOMS ALPHA RESEARCH GROUP, LLC 2001-05-15 US claimed
US-5731125-A FOR FORMING RESIST FILM JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-03-24 US claimed
EP-0558280-A1 Chemically amplified resist JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-09-01 EP claimed
EP-0523957-A1 Radiation-sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-01-20 EP claimed