SCHEMBL5199559

SCHEMBL5199559

Sc1nc2ccccc2n1Cc1ccccc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TNF P01375 1/20 0.65
ALDH1A1 P00352 5/20 0.63
MEN1 O00255 3/20 0.63
KMT2A Q03164 3/20 0.63
LMNA P02545 3/20 0.63
PDE6D O43924 1/20 0.63
ALDH2 P05091 1/20 0.63
ALDH3A1 P30838 1/20 0.63
CYP2C19 P33261 3/20 0.56
CYP2C9 P11712 2/20 0.56
CYP1A2 P05177 2/20 0.56
CFTR P13569 1/20 0.56
HKDC1 Q2TB90 1/20 0.55
L3MBTL1 Q9Y468 1/20 0.55
CYP2D6 P10635 1/20 0.55
TP53 P04637 3/20 0.54
MAPT P10636 3/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
HTT P42858 1/20 0.54
PDE4A P27815 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10353872 0.87 RAB9A (0.50) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL13258286 0.87 TP53 (0.67) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL9537915 0.87 RAB9A (0.65) ALDH1A1MEN1KMT2ALMNACYP2D6
SCHEMBL10353246 0.85 TNF (0.52) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL7681201 0.84 POLB (0.62) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL10353137 0.83 KMT2A (0.71) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL10353544 0.83 SMN1; SMN2 (0.69) ALDH1A1LMNAL3MBTL1CYP2D6TP53
SCHEMBL10353130 0.82 HTT (0.54) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL10353129 0.82 KMT2A (0.51) TNFALDH1A1MEN1KMT2ALMNA
SCHEMBL14112988 0.81 MEN1 (0.49) TNFALDH1A1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110269071-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-11-03 US disclosed
US-20110269071-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-11-03 US disclosed
US-20080160452-A1 Developer for light sensitive planographic printing plate material and manufacturing process of planographic printing plate employing the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2008-07-03 US disclosed
US-20080160452-A1 Developer for light sensitive planographic printing plate material and manufacturing process of planographic printing plate employing the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2008-07-03 US disclosed
EP-1217432-B1 Silver halide photographic light-sensitive material and method for processing the same FUJIFILM CORP (JP) 2007-08-15 EP disclosed
US-6544718-B2 Hydrophilic colloid layer includes a disulfide or dimercapto compound of given formula; for photomechanical plate-making that exhibits ultrahigh-contrast photographic characteristics FUJI PHOTO FILM CO., LTD. (JP) 2003-04-08 US disclosed
US-20030022113-A1 Silver halide photographic light-sensitive material and method for processing same FUJI PHOTO FILM CO., LTD. 2003-01-30 US disclosed
EP-1217432-A2 Silver halide photographic light-sensitive material and method for processing the same FUJI PHOTO FILM CO., LTD. (JP) 2002-06-26 EP disclosed
US-6376666-B1 PSYCHOLOGICAL DISORDERS; CARDIOVASCUALR DISORDERS NAUCHNO-ISSLEDOVATELSKY INSTITUT FARMAKOLOGII ROSSIISKOI AKADEMII MEDITSINSKIKH NAUK (RU) 2002-04-23 US disclosed
US-6171753-B1 SUPPORT HAVING THEREON SPECTRALLY SENSITIZED LIGHT SENSITIVE SILVER HALIDE EMULSION LAYER CONTAINING AT LEAST TWO KINDS OF SILVER HALIDE EMULSIONS DIFFERENT IN THE CONCENTRATION OF A NITROGEN HETEROCYCLE CAPABLE OF FORMING COMPLEX WITH SILVER FUJI PHOTO FILM CO., LTD. (JP) 2001-01-09 US disclosed
US-6114081-A COMPRISING A SUPPORT HAVING THEREON AT LEAST ONE OF SPECTRALLY SENSITIZED LIGHT-SENSITIVE SILVER HALIDE EMULSION LAYERS, WHEREIN AT LEAST ONE OF THE SILVER HALIDE EMULSION LAYERS CONTAINS AT LEAST TWO KINDS OF SILVER HALIDE EMULSIONS FUJI PHOTO FILM CO., LTD. (JP) 2000-09-05 US disclosed
EP-0788795-A1 PHARMACOLOGICALLY ACTIVE 2-MERCAPTOBENZIMIDAZOLE DERIVATIVES NAUCHNO-ISSLEDOVATELSKY INSTITUT FARMAKOLOGII AKADEMII MEDITSINSKIKH NAUK (RU) 1997-08-13 EP disclosed
EP-0190817-B1 DOPAMINE-BETA-HYDROXYLASE INHIBITORS SMITHKLINE BEECHAM CORPORATION (US) 1990-09-05 EP disclosed
US-4857540-A 1-SUBSTITUTED-2-MERCAPTO-(OR AMINOMETHYL-)BENZAMIDAZOLE COMPOUNDS SMITHKLINE BECKMAN CORPORATION (US) 1989-08-15 US disclosed
US-4728741-A DOPAMINE BETA-HYDROXYLASE INHIBITOR SMITHKLINE BECKMAN CORPORATION (US) 1988-03-01 US disclosed
EP-0122125-B1 SILVER HALIDE EMULSION KONICA CORPORATION (JP) 1987-07-15 EP disclosed
EP-0190817-A1 Dopamine-beta-hydroxylase inhibitors SMITHKLINE BEECHAM CORPORATION (US) 1986-08-13 EP disclosed
US-4565778-A COMPRISING CORE/SHELL GRAINS OF SILVER IODOBROMIDE REPENED BY A LABILE SELENIUM COMPOUND;PHOTOSENSITIVITY;ANTIFOGGING AGENTS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-01-21 US disclosed
EP-0122125-A1 Silver halide emulsion KONICA CORPORATION (JP) 1984-10-17 EP disclosed
EP-0121435-A1 Silver halide photographic materials KONICA CORPORATION (JP) 1984-10-10 EP disclosed