SCHEMBL5228296

SCHEMBL5228296

C=C(C)C(=O)OCOc1ccc(C(C)(C)c2ccc(OCC)cc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AR P10275 1/20 0.43
POLB P06746 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
HTT P42858 2/20 0.43
APEX1 P27695 1/20 0.43
ALDH1A1 P00352 5/20 0.41
RAB9A P51151 2/20 0.41
NPC1 O15118 1/20 0.41
EPHX2 P34913 1/20 0.41
NR1H4 Q96RI1 1/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
PLK1 P53350 1/20 0.41
LMNA P02545 1/20 0.41
CYP1A2 P05177 1/20 0.41
PARP10 Q53GL7 1/20 0.40
KDM4E B2RXH2 4/20 0.39
NQO1 P15559 1/20 0.39
MAPT P10636 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1280197 0.94 POLB (0.47) ARPOLBTDP1HTTAPEX1
SCHEMBL2158767 0.89 KDM4E (0.51) POLBTDP1HTTAPEX1ALDH1A1
SCHEMBL14030018 0.88 POLB (0.51) ARPOLBTDP1HTTAPEX1
SCHEMBL5482340 0.86 RAB9A (0.40) ARPOLBTDP1HTTALDH1A1
SCHEMBL12265865 0.83 HTT (0.49) ARPOLBTDP1HTTAPEX1
Propane SCHEMBL9476274 0.82 HTT (0.53) ARPOLBTDP1HTTAPEX1
SCHEMBL59813 0.81 POLB (0.56) ARPOLBTDP1HTTAPEX1
SCHEMBL14173142 0.81 POLB (0.56) ARPOLBTDP1HTTAPEX1
SCHEMBL22688241 0.80 HTT (0.46) ARPOLBTDP1HTTAPEX1
SCHEMBL346370 0.80 POLB (0.62) POLBTDP1HTTAPEX1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070231747-A1 Radiation-sensitive negative resin composition JSR CORPORATION (JP) 2007-10-04 US disclosed
EP-1826612-A1 Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings JSR Corporation (JP) 2007-08-29 EP disclosed
US-20070196765-A1 RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS JSR CORPORATION (JP) 2007-08-23 US disclosed