Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.36 |
| ▸ | MAPT | P10636 | 4/20 | 0.36 |
| ▸ | NPC1 | O15118 | 3/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | S100A4 | P26447 | 1/20 | 0.33 |
| ▸ | MTOR | P42345 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6706095 | 1.00 | ALDH1A1 (0.36) | ALDH1A1SMN1; SMN2MAPTNPC1RAB9A | |
| SCHEMBL19418706 | 0.93 | PLA2G7 (0.36) | MAPTNPC1PLA2G7HSD17B10 | |
| SCHEMBL9891196 | 0.93 | PLA2G7 (0.36) | MAPTNPC1PLA2G7HSD17B10 | |
| SCHEMBL18431381 | 0.93 | PLA2G7 (0.36) | MAPTNPC1PLA2G7HSD17B10 | |
| SCHEMBL14375142 | 0.87 | HSD17B10 (0.38) | ALDH1A1SMN1; SMN2MAPTLMNAPLA2G7 | |
| SCHEMBL10233179 | 0.87 | ENPP2 (0.37) | ALDH1A1SMN1; SMN2MAPTLMNAMEN1 | |
| SCHEMBL18957974 | 0.86 | ALDH1A1 (0.40) | ALDH1A1SMN1; SMN2MAPTNPC1RAB9A | |
| SCHEMBL10097224 | 0.86 | ALDH1A1 (0.40) | ALDH1A1SMN1; SMN2MAPTNPC1RAB9A | |
| SCHEMBL10083959 | 0.86 | ALDH1A1 (0.40) | ALDH1A1SMN1; SMN2MAPTNPC1RAB9A | |
| SCHEMBL296477 | 0.85 | GSK3B (0.36) | ALDH1A1SMN1; SMN2MAPTNPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040013974-A1 | Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity | DIETLIKER KURT (CH) | 2004-01-22 | — | — | US | claimed |
| EP-0925529-A1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | Ciba SC Holding AG (CH) | 1999-06-30 | — | — | EP | claimed |
| WO-1998010335-A1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 1998-03-12 | — | — | WO | claimed |
| CN-120044752-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-116583784-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| WO-2022138648-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-112987497-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2021-06-18 | — | — | CN | disclosed |
| EP-2131423-B1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-20160195814-A1 | PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT | FUJIFILM CORPORATION (JP) | 2016-07-07 | — | — | US | disclosed |
| EP-1806619-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2015-04-22 | — | — | EP | disclosed |
| US-8795944-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| EP-0848289-B1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2002-02-27 | — | — | EP | disclosed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5928837-A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0925529-A1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | Ciba SC Holding AG (CH) | 1999-06-30 | — | — | EP | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| WO-1998010335-A1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 1998-03-12 | — | — | WO | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040013974-A1 | Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity | SULT1E1, CCNT1, CCNE1 | ALDH1A1 1150/4885SMN1; SMN2 1833/4885MAPT 4376/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.