SCHEMBL523852

SCHEMBL523852

CC(=O)OC[Si](C)(C)OC(C)=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.42
LMNA P02545 1/20 0.42
HSD17B10 Q99714 1/20 0.42
CHRM5 P08912 2/20 0.34
CHRM1 P11229 2/20 0.34
CHRM3 P20309 2/20 0.34
TSHR P16473 2/20 0.34
PGR P06401 1/20 0.34
CHRM2 P08172 1/20 0.34
CHRM4 P08173 1/20 0.34
HTR1A P08908 1/20 0.34
CHRNB2 P17787 1/20 0.34
TBXA2R P21731 1/20 0.34
CHRNB4 P30926 1/20 0.34
CHRNA3 P32297 1/20 0.34
CHRNA7 P36544 1/20 0.34
CHRNA4 P43681 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CHRNA10 Q9GZZ6 1/20 0.34
CHRNA9 Q9UGM1 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4941379 0.82 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL5401378 0.81 TSHR (0.44) ALDH1A1LMNAHSD17B10TSHRTDP1
SCHEMBL2303044 0.80 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL5406656 0.79 TSHR (0.42) ALDH1A1HSD17B10TSHRSMN1; SMN2
SCHEMBL11324715 0.78 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL13151001 0.76 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL2409855 0.76 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL704202 0.76 ALDH1A1 (0.35) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL8422452 0.76
SCHEMBL704696 0.76 ALDH1A1 (0.35) ALDH1A1LMNAHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-5182315-A Endcapping LOCTITE CORPORATION (US) 1993-01-26 US claimed
EP-3877087-A1 ANTI-CLOGGING MICROFLUIDIC MULTICHANNEL DEVICE President And Fellows Of Harvard College (US) 2021-09-15 EP disclosed
US-10731012-B2 Anti-clogging microfluidic multichannel device PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2020-08-04 US disclosed
US-20200140628-A1 MICROFLUIDIC MULTICHANNEL DEVICE PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2020-05-07 US disclosed
EP-3141538-B1 IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS VERSUM MAT US LLC (US) 2019-10-30 EP disclosed
EP-0487291-B1 Photocurable silicon composition, and method of making same LOCTITE CORP (US) 1999-09-29 EP disclosed
US-5348986-A Polysiloxanes capped with mixture of curable groups, gels, acrylated polymers LOCTITE CORPORATION (US) 1994-09-20 US disclosed
US-5182315-A Endcapping LOCTITE CORPORATION (US) 1993-01-26 US disclosed
EP-0487291-A2 Photocurable silicon composition, and method of making same LOCTITE CORPORATION (US) 1992-05-27 EP disclosed