Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17805477 | 1.00 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL22841004 | 0.95 | TSHR (0.32) | TSHR | |
| SCHEMBL6754067 | 0.86 | HSD11B1 (0.31) | — | |
| SCHEMBL17247254 | 0.86 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL21510907 | 0.85 | — | — | |
| SCHEMBL684893 | 0.84 | TSHR (0.31) | TSHR | |
| SCHEMBL4399164 | 0.84 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL685713 | 0.84 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL28227379 | 0.83 | — | — | |
| SCHEMBL5349549 | 0.83 | HSD11B1 (0.33) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1553 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250293030-A1 | SOLUBILITY SWITCH TOPOGRAPHIC FILL MATERIALS AND METHODS | BREWER SCIENCE, INC. | 2025-09-18 | — | — | US | claimed |
| CN-120025480-A | Modified styrene-acrylic emulsion, interior wall coating and preparation method thereof | 立邦涂料（中国）有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-119930906-A | PAG (polyamide) bonded photoresist film-forming resin and preparation method thereof | 杭州先研科技有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119735762-A | Acrylic emulsion, application thereof and emulsion pressure-sensitive adhesive | 成都友一包装材料有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-119708332-A | Polymer for ArF photoresist, preparation method of polymer and photoresist composition | 中节能万润股份有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-119286334-B | Modified acrylic resin, preparation method thereof, transfer coating and transfer film | 广州慧谷新材料科技股份有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-119613607-A | Preparation method of 193nm photoresist resin | 江苏集萃光敏电子材料研究所有限公司 | 2025-03-14 | — | — | CN | claimed |
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-119286334-A | Modified acrylic resin, preparation method thereof, transfer coating and transfer film | 广州慧谷新材料科技股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-118652494-A | PP cutlery box recycling material for carpet fibers and preparation method thereof | 东莞市宇捷实业投资有限公司 | 2024-09-17 | — | — | CN | claimed |
| CN-108132584-B | Photoresist composition containing poly (p-hydroxystyrene) polymer and acrylate copolymer | 江苏汉拓光学材料有限公司 | 2020-12-08 | — | — | CN | claimed |
| CN-111999981-A | Intelligent femtosecond laser photoresist composition and patterning method | 之江实验室 | 2020-11-27 | — | — | CN | claimed |
| CN-111983892-A | Photoinduction anti-oxygen polymerization inhibition femtosecond laser photoresist and preparation method thereof | 之江实验室 | 2020-11-24 | — | — | CN | claimed |
| CN-109294314-A | A kind of epoxy acrylic cathode electrophoresis dope resin emulsion and preparation method thereof | 中国海洋石油集团有限公司 | 2019-02-01 | — | — | CN | claimed |
| US-8916330-B2 | Chemically amplified photoresist composition and method for forming resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-23 | — | — | US | claimed |
| US-8883394-B2 | — | — | 2014-11-11 | — | — | US | claimed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | claimed |
| CN-101930178-A | The manufacture method of chemical amplifying type photo-corrosion-resisting agent composition and corrosion-resisting pattern | SUMITOMO CHEMICAL CO | 2010-12-29 | — | — | CN | claimed |
| US-7579132-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | claimed |
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-02-21 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | NHERF1, SLC26A3, HCN3 | TSHR 1310/4885ALDH1A1 2760/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.