SCHEMBL526437

SCHEMBL526437

C[Si](C)(C)O[Si](C)(CCC(=O)O)CCC(=O)O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.36
EGLN1 Q9GZT9 3/20 0.36
ALKBH5 Q6P6C2 1/20 0.36
SUCNR1 Q9BXA5 1/20 0.36
FFAR3 O14843 1/20 0.36
HDAC3 O15379 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36
HDAC8 Q9BY41 1/20 0.36
SLC15A2 Q16348 1/20 0.35
GABRP O00591 2/20 0.34
GABRD O14764 2/20 0.34
GABRA1 P14867 2/20 0.34
GABRB1 P18505 2/20 0.34
GABRG2 P18507 2/20 0.34
GABRB3 P28472 2/20 0.34
GABRA5 P31644 2/20 0.34
GABRA3 P34903 2/20 0.34
GABRA2 P47869 2/20 0.34
GABRB2 P47870 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL527209 0.86 LMNA (0.42) LMNATSHRSLC22A6ALDH1A1AKR1B1
SCHEMBL1048691 0.83 TSHR (0.48) LMNATSHRSLC22A6ALDH1A1NFKB1
SCHEMBL30612730 0.81 LMNA (0.36) LMNAEGLN1ALKBH5SUCNR1FFAR3
SCHEMBL4967244 0.81 TSHR (0.38) LMNAEGLN1ALKBH5SUCNR1FFAR3
SCHEMBL30612731 0.81 LMNA (0.36) LMNAEGLN1ALKBH5SUCNR1FFAR3
SCHEMBL527377 0.77 TSHR (0.33) LMNAFFAR3TSHRALDH1A1
SCHEMBL30612699 0.76 EGLN1 (0.33) LMNAEGLN1ALKBH5SUCNR1FFAR3
SCHEMBL31207941 0.76 EGLN1 (0.33) LMNAEGLN1ALKBH5SUCNR1FFAR3
SCHEMBL513566 0.75 TSHR (0.41) LMNAEGLN1ALKBH5SUCNR1FFAR3
Hydrochloric Acid SCHEMBL11148349 0.73 TSHR (0.39) LMNAEGLN1ALKBH5SUCNR1FFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113710226-B Cosmetic material 陶氏东丽株式会社 2024-02-27 CN disclosed
CN-114040746-B Oil-in-water type cleansing cosmetic 陶氏东丽株式会社 2024-02-27 CN disclosed
CN-112789027-B Oil-in-water type emulsified cosmetic 陶氏东丽株式会社 2023-11-07 CN disclosed
CN-112689500-B Oil-in-water type emulsified cosmetic 陶氏东丽株式会社 2023-09-12 CN disclosed
CN-112789022-B Oil-in-water type emulsified cosmetic 陶氏东丽株式会社 2023-08-25 CN disclosed
CN-112804988-B Cosmetic material 陶氏东丽株式会社 2023-07-18 CN disclosed
CN-114040746-A Oil-in-water type cleansing cosmetic 陶氏东丽株式会社 2022-02-11 CN disclosed
CN-113710226-A Cosmetic material 陶氏东丽株式会社 2021-11-26 CN disclosed
CN-112804988-A Cosmetic material 陶氏东丽株式会社 2021-05-14 CN disclosed
CN-112789022-A Oil-in-water type emulsified cosmetic 陶氏东丽株式会社 2021-05-11 CN disclosed
CN-112789027-A Oil-in-water type emulsified cosmetic 陶氏东丽株式会社 2021-05-11 CN disclosed
CN-112739321-A Aqueous dispersion composition and use thereof 陶氏东丽株式会社 2021-04-30 CN disclosed
CN-112689500-A Oil-in-water type emulsified cosmetic 陶氏东丽株式会社 2021-04-20 CN disclosed
CN-106163495-B Cosmetic preparation 道康宁东丽株式会社 2020-04-14 CN disclosed
EP-2598589-A1 A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN AZ Electronic Materials USA Corp. (US) 2013-06-05 EP disclosed
WO-2012014059-A1 A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN AZ ELECTRONIC MATERIALS USA CORP. (US) 2012-02-02 WO disclosed