SCHEMBL5315848

SCHEMBL5315848

[O-][N+]1(c2ccccc2)CCCC1n1cccc1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.32
DRD4 P21917 1/20 0.32
DRD3 P35462 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3069555 0.67 DRD2 (0.38) DRD2DRD4DRD3
SCHEMBL523274 0.62 SLC18A3 (0.32) DRD3
SCHEMBL1828313 0.59 LMNA (0.33)
SCHEMBL11224081 0.59 LMNA (0.33)
SCHEMBL76560 0.57 LMNA (0.32)
SCHEMBL2282241 0.56 CHRNA7 (0.31)
SCHEMBL8368266 0.56 CYP1A2 (0.31)
SCHEMBL12488580 0.56 CHRNA7 (0.32)
SCHEMBL9051047 0.56 CYP1A2 (0.44)
Hydrochloric Acid SCHEMBL7459719 0.56 PABPC1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1441254-B1 Photothermographic material FUJIFILM CORP (JP) 2007-03-28 EP disclosed
EP-1742105-A2 Photothermographic material Fuji Photo Film Co., Ltd. (JP) 2007-01-10 EP disclosed
US-20060110691-A9 Photothermographic material OHZEKI TOMOYUKI 2006-05-25 US disclosed
US-20040234906-A1 high sensitivity with a low degree of fogging and is excellent in raw stock storability and print-out resistance of images; contains: a compound having an adsorption group to silver halide and a reducing group, or a precursor of the compound; and a development accelerator FUJIFILM CORPORATION (JP) 2004-11-25 US disclosed
EP-1441254-A1 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2004-07-28 EP disclosed