SCHEMBL532741

SCHEMBL532741

CCCC[B-](c1ccccc1)(c1ccccc1)c1ccccc1.Cc1ccc([I+]c2ccc(C3CCCCC3)cc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 3/20 0.36
DRD4 P21917 2/20 0.36
DRD3 P35462 2/20 0.36
DRD1 P21728 1/20 0.36
DRD5 P21918 1/20 0.36
ALDH1A1 P00352 2/20 0.36
LMNA P02545 1/20 0.36
TP53 P04637 1/20 0.36
MAPT P10636 1/20 0.36
ATM Q13315 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
SLC18A3 Q16572 3/20 0.33
NOS3 P29474 2/20 0.33
NOS1 P29475 2/20 0.33
NOS2 P35228 2/20 0.33
ADRA1D P25100 1/20 0.31
ADRA1A P35348 1/20 0.31
ADRA1B P35368 1/20 0.31
ESRRB O95718 1/20 0.31
ESRRG P62508 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL532780 0.82 SMN1; SMN2 (0.42) ALDH1A1LMNATP53MAPTATM
SCHEMBL1412709 0.77 TSHR (0.33) SMN1; SMN2
SCHEMBL1417522 0.77 LMNA (0.51) ALDH1A1LMNATP53MAPTATM
SCHEMBL533348 0.73 SLC18A3 (0.44) ALDH1A1SMN1; SMN2SLC18A3
SCHEMBL1897423 0.73 CNR2 (0.31) DRD2DRD4DRD3DRD1DRD5
SCHEMBL29762350 0.72 SLC18A3 (0.52) ALDH1A1MAPTSMN1; SMN2SLC18A3
P-Xylene SCHEMBL27546052 0.72 SLC18A3 (0.52) ALDH1A1LMNATP53MAPTATM
SCHEMBL7038061 0.71 KDM1A (0.33) ALDH1A1LMNATP53MAPT
Toluene SCHEMBL28184886 0.71 SLC18A3 (0.53) ALDH1A1LMNATP53MAPTATM
SCHEMBL225939 0.71 TSHR (0.38) TP53SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2021873-B1 NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS EASTMAN KODAK CO (US) 2013-03-27 EP claimed
US-20070275322-A1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY 2007-11-29 US claimed
US-20230382100-A1 A Lithographic Printing Plate Precursor AGFA OFFSET BV (BE) 2023-11-30 US disclosed
US-20230350291-A1 A Lithographic Printing Plate Precursor AGFA OFFSET BV (BE) 2023-11-02 US disclosed
US-20230311474-A1 A Lithographic Printing Plate Precursor AGFA OFFSET BV (BE) 2023-10-05 US disclosed
EP-3928983-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR ECO3 BV (BE) 2023-09-27 EP disclosed
US-20230266667-A1 A Lithographic Printing Plate Precursor AGFA OFFSET BV (BE) 2023-08-24 US disclosed
EP-3793831-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA OFFSET BV (BE) 2023-07-12 EP disclosed
US-20230213856-A1 A Lithographic Printing Plate Precursor AGFA OFFSET BV (BE) 2023-07-06 US disclosed
US-11633948-B2 Method for making lithographic printing plates EASTMAN KODAK COMPANY (US) 2023-04-25 US disclosed
CN-115989455-A Lithographic printing plate precursor 爱克发胶印有限公司 2023-04-18 CN disclosed
US-7452638-B2 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2008-11-18 US disclosed
US-20080280229-A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE CITICORP NORTH AMERICA, INC., AS AGENT 2008-11-13 US disclosed
US-20080085475-A1 METHOD OF IMAGING AND DEVELOPING NEGATIVE-WORKING ELEMENTS TAO TING 2008-04-10 US disclosed
US-20080070152-A1 NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS BANK OF AMERICA, N.A., AS AGENT 2008-03-20 US disclosed
US-20080044767-A1 NEGATIVE-WORKING IMAGEABLE MATERIALS KODAK (NEAR EAST) INC. 2008-02-21 US disclosed
US-7332253-B1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2008-02-19 US disclosed
US-7326521-B1 Method of imaging and developing negative-working elements EASTMAN KODAK COMPANY (US) 2008-02-05 US disclosed
US-20070275322-A1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY 2007-11-29 US disclosed
US-20060269874-A1 On-press developable negative-working imageable elements KODAK POLYCHROME GRAPHICS LLC 2006-11-30 US disclosed