Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 14/20 | 0.61 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.39 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 4/20 | 0.36 |
| ▸ | CHRM5 | P08912 | 4/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28757871 | 0.98 | KIF11 (0.59) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL15051981 | 0.98 | KIF11 (0.59) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| Ammonia Solution, Strong SCHEMBL4606388 | 0.98 | KIF11 (0.59) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL810137 | 0.91 | KIF11 (0.57) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL8365385 | 0.87 | SIGMAR1 (0.50) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL7092683 | 0.85 | KIF11 (0.54) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| Diethylaniline SCHEMBL6747844 | 0.82 | KIF11 (0.44) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| Tetrabuthylammonium SCHEMBL22518565 | 0.82 | KIF11 (0.44) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL8772344 | 0.81 | KIF11 (0.43) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL1149158 | 0.79 | KIF11 (0.64) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119472164-A | Chiral photopolymer composition, holographic grating and holographic device | 杭州光粒科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-115595001-B | Photosensitive polymer composition, preparation method thereof and holographic diffraction grating element | 杭州光粒科技有限公司 | 2024-01-09 | — | — | CN | claimed |
| CN-116874714-B | Polyurethane foaming tyre with low hysteresis loss and preparation method thereof | 山东一诺威新材料有限公司 | 2023-12-12 | — | — | CN | claimed |
| CN-116874714-A | Polyurethane foaming tyre with low hysteresis loss and preparation method thereof | 山东一诺威新材料有限公司 | 2023-10-13 | — | — | CN | claimed |
| EP-4010441-B1 | LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2023-09-06 | — | — | EP | claimed |
| CN-114647151-A | Photocurable negative photoresist composition, lithographic plate and application thereof | 安徽秀朗新材料科技有限公司 | 2022-06-21 | — | — | CN | claimed |
| US-20250339898-A1 | METHOD FOR THE ECONOMIC MANUFACTURING OF METALLIC PARTS | INNOMAQ 21, S.L. (ES) | 2025-11-06 | — | — | US | disclosed |
| WO-2025100525-A1 | ADHESIVE MEMBER, ADHESIVE MATERIAL KIT, COPOLYMER, COMPOSITION CONTAINING SAID COPOLYMER, AND COMPOSITION CONTAINING MONOMER | 大阪有機化学工業株式会社 | 2025-05-15 | — | — | WO | disclosed |
| US-20250155845-A1 | Triarylalkyl Borate Salts as Coinitiators in NIR Photopolymer Compositions | COVESTRO DEUTSCHLAND AG (DE) | 2025-05-15 | — | — | US | disclosed |
| US-20250122316-A1 | CURABLE COMPOSITION AND CURED PRODUCT | DEXERIALS CORPORATION (JP) | 2025-04-17 | — | — | US | disclosed |
| CN-119522207-A | Fluorinated compound, photopolymerizable composition, hologram recording medium, method for producing the same, and optical element comprising the same | 株式会社LG化学 | 2025-02-25 | — | — | CN | disclosed |
| CN-119472164-A | Chiral photopolymer composition, holographic grating and holographic device | 杭州光粒科技有限公司 | 2025-02-18 | — | — | CN | disclosed |
| US-12227612-B2 | Ultrafast cyclic ether-amine photopolyaddition and uses thereof | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2025-02-18 | — | — | US | disclosed |
| US-4800149-A | FREE RADICAL GENERATION AND CROSSLINKING | THE MEAD CORPORATION (US) | 1989-01-24 | — | — | US | disclosed |
| US-4788124-A | IONIC DYE-REACTIVE COUNTER ION COMPOUND | THE MEAD CORPORATION (US) | 1988-11-29 | — | — | US | disclosed |
| US-4772530-A | XANTHENE AND OXONOL DYES | THE MEAD CORPORATION (US) | 1988-09-20 | — | — | US | disclosed |
| US-4772541-A | SENSITIVE AT LONGER WAVELENGTHS | THE MEAD CORPORATION (US) | 1988-09-20 | — | — | US | disclosed |
| EP-0277034-A2 | Lamination of two substrates | THE MEAD CORPORATION (US) | 1988-08-03 | — | — | EP | disclosed |
| US-4751102-A | FOR PHOTOHARDENABLE FREE RADICAL ADDITION POLYMERIZABLE OR CROSSLINKABLE COMPOUND | THE MEAD CORPORATION (US) | 1988-06-14 | — | — | US | disclosed |
| EP-0223587-A1 | Photosensitive materials containing ionic dye compounds as initiators | THE MEAD CORPORATION (US) | 1987-05-27 | — | — | EP | disclosed |