Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11376435 | 0.84 | L3MBTL1 (0.62) | SMN1; SMN2ALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL3356584 | 0.82 | PTGS2 (0.59) | CYP2C9 | |
| SCHEMBL2339443 | 0.78 | SMN1; SMN2 (0.59) | SMN1; SMN2ALDH1A1LMNANPC1RAB9A | |
| SCHEMBL11510201 | 0.78 | MAPK1 (0.43) | SMN1; SMN2ALDH1A1LMNANPC1RAB9A | |
| SCHEMBL10585221 | 0.78 | SMN1; SMN2 (0.59) | SMN1; SMN2ALDH1A1LMNATSHRNPC1 | |
| SCHEMBL2211208 | 0.78 | SMN1; SMN2 (0.37) | SMN1; SMN2ALDH1A1LMNATSHRNPC1 | |
| SCHEMBL23410445 | 0.77 | SMN1; SMN2 (0.62) | SMN1; SMN2ALDH1A1LMNATSHRNPC1 | |
| SCHEMBL10585226 | 0.77 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1LMNATSHRNPC1 | |
| SCHEMBL24747511 | 0.77 | SMN1; SMN2 (0.62) | SMN1; SMN2ALDH1A1LMNATSHRCYP1A2 | |
| SCHEMBL5924543 | 0.77 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1LMNATSHRNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3132932-B1 | LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS | PRESSTEK LLC (US) | 2020-04-15 | — | — | EP | disclosed |
| US-20180117900-A1 | EDGE TREATMENT FOR DEVELOP-ON-PRESS LITHOGRAPHIC PRINTING MEMBERS | PRESSTEK, INC. | 2018-05-03 | — | — | US | disclosed |
| EP-2906640-B1 | COATING/SEALANT SYSTEMS, AQUEOUS RESINOUS DISPERSIONS, METHODS FOR MAKING AQUEOUS RESINOUS DISPERSIONS, AND METHODS OF ELECTROCOATING | PRC DESOTO INT INC (US) | 2017-11-15 | — | — | EP | disclosed |
| EP-2756043-B1 | COATING/SEALANT SYSTEMS, AQUEOUS RESINOUS DISPERSIONS, AND METHODS OF ELECTROCOATING | PRC DESOTO INT INC (US) | 2017-04-12 | — | — | EP | disclosed |
| EP-3132932-A2 | LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS | Presstek, LLC. (US) | 2017-02-22 | — | — | EP | disclosed |
| US-20170021656-A1 | LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS | PRESSTEK, LLC. | 2017-01-26 | — | — | US | disclosed |
| EP-2033051-B1 | NEGATIVE-WORKING IMAGEABLE ELEMENTS | EASTMAN KODAK CO (US) | 2016-11-30 | — | — | EP | disclosed |
| US-9181628-B2 | Coating/sealant systems, aqueous resinous dispersions, and methods of electrocoating | PRC-DESOTO INTERNATIONAL, INC. (US) | 2015-11-10 | — | — | US | disclosed |
| EP-2906640-A1 | COATING/SEALANT SYSTEMS, AQUEOUS RESINOUS DISPERSIONS, METHODS FOR MAKING AQUEOUS RESINOUS DISPERSIONS, AND METHODS OF ELECTROCOATING | PRC-Desoto International, Inc. (US) | 2015-08-19 | — | — | EP | disclosed |
| EP-2217970-B1 | IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS | EASTMAN KODAK CO (US) | 2015-06-03 | — | — | EP | disclosed |
| WO-2007097907-A2 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-08-30 | — | — | WO | disclosed |
| US-20070184380-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY | 2007-08-09 | — | — | US | disclosed |
| WO-2007019031-A2 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |
| US-7175949-B1 | Radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2007-02-13 | — | — | US | disclosed |
| US-7175969-B1 | Method of preparing negative-working radiation-sensitive elements | EASTMAN KODAK COMPANY (US) | 2007-02-13 | — | — | US | disclosed |
| US-7153632-B1 | Radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2006-12-26 | — | — | US | disclosed |
| EP-1622768-A1 | ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES CONTAINING AN ONIUM SALT INITIATOR SYSTEM | Kodak Polychrome Graphics LLC (US) | 2006-02-08 | — | — | EP | disclosed |
| WO-2004101280-A1 | ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES CONTAINING AN ONIUM SALT INITIATOR SYSTEM | KODAK POLYCHROME GRAPHICS LLC (US) | 2004-11-25 | — | — | WO | disclosed |
| US-20040229165-A1 | On-press developable IR sensitive printing plates containing an onium salt initiator system | BANK OF AMERICA, N.A., AS AGENT | 2004-11-18 | — | — | US | disclosed |
| US-5328803-A | Alkali developable solutions with carboxy group binders and monomer with initiators | FUJI PHOTO FILM CO., LTD. (JP) | 1994-07-12 | — | — | US | disclosed |