SCHEMBL533855

SCHEMBL533855

CC(C)(C)c1ccccc1[I+]c1ccccc1C(C)(C)C.Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34
TSHR P16473 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29627980 1.00 ALDH1A1 (0.34) ALDH1A1TSHRTDP1CA2
SCHEMBL216497 0.81 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2
SCHEMBL29851795 0.81 ALDH1A1 (0.48) ALDH1A1TSHRTDP1CA2
Hydrochloric Acid SCHEMBL6262076 0.79 ALDH1A1 (0.46) ALDH1A1TSHRTDP1CA2
Iodide SCHEMBL2968442 0.79 ALDH1A1 (0.46) ALDH1A1TSHRTDP1CA2
Water SCHEMBL107595 0.79 ALDH1A1 (0.46) ALDH1A1TSHRTDP1CA2
SCHEMBL29730022 0.77 ALDH1A1 (0.41) ALDH1A1TSHRTDP1CA2
SCHEMBL9312855 0.77 ALDH1A1 (0.41) ALDH1A1TSHRTDP1CA2
SCHEMBL30248741 0.77 ALDH1A1 (0.35) ALDH1A1TSHRTDP1CA2
SCHEMBL1477598 0.77 ALDH1A1 (0.35) ALDH1A1TSHRTDP1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110003123-A1 SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) 2011-01-06 US claimed
WO-2009109579-A1 SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES EASTMAN KODAK COMPANY (US) 2009-09-11 WO claimed
EP-2098367-A1 Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates EASTMAN KODAK COMPANY (US) 2009-09-09 EP claimed
US-7524614-B2 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2009-04-28 US claimed
US-20070275322-A1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY 2007-11-29 US claimed
US-12517430-B2 Lithographic printing plate precursor ECO3 BV (BE) 2026-01-06 US disclosed
US-12487526-B2 Lithographic printing plate precursor ECO3 BV (BE) 2025-12-02 US disclosed
US-12403686-B2 Lithographic printing plate precursor ECO3 BV (BE) 2025-09-02 US disclosed
EP-4171958-B1 LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MAKING A PRINTING PLATE PRECURSOR AND METHOD FOR MAKING A PRINTING PLATE ECO3 BV (BE) 2025-08-13 EP disclosed
EP-3960455-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR, A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR AND A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE ECO3 BV (BE) 2025-08-06 EP disclosed
EP-4171957-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR ECO3 BV (BE) 2025-02-12 EP disclosed
WO-2024231377-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR ECO3 BV (BE) 2024-11-14 WO disclosed
US-20060083890-A1 Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material FUJI PHOTO FILM CO., LTD. (JP) 2006-04-20 US disclosed
US-20050058910-A1 Hologram recording method and hologram recording material FUJI PHOTO FILM CO., LTD. 2005-03-17 US disclosed
US-20050046915-A1 Hologram recording material composition, hologram recording material and hologram recording method FUJI PHOTO FILM CO., LTD. 2005-03-03 US disclosed
EP-1510862-A2 Hologram recording method and hologram recording material Fuji Photo Film Co., Ltd. (JP) 2005-03-02 EP disclosed
EP-1508833-A2 Hologram recording material composition, hologram recording material and hologram recording method FUJI PHOTO FILM CO., LTD. (JP) 2005-02-23 EP disclosed
US-20050019711-A1 Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material FUJI PHOTO FILM CO., LTD. 2005-01-27 US disclosed
US-20050003133-A1 Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method FUJI PHOTO FILM CO., LTD. 2005-01-06 US disclosed
US-20040245432-A1 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJI PHOTO FILM CO., LTD. 2004-12-09 US disclosed