SCHEMBL533990

SCHEMBL533990

CCO[Si](CC)(CC)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.34
TSHR P16473 2/20 0.34
TP53 P04637 2/20 0.33
ELANE P08246 1/20 0.33
RELA Q04206 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31
ALDH1A1 P00352 2/20 0.31
KDM4E B2RXH2 1/20 0.31
NPC1 O15118 1/20 0.31
HPGD P15428 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
KCNH2 Q12809 1/20 0.31
GLA P06280 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29273135 0.92 ESR1 (0.31) LTA4HTSHRESR1ESR2
SCHEMBL712792 0.88 ESR1 (0.36) ESR1ESR2
SCHEMBL3481868 0.88 TSHR (0.31) LTA4HTSHR
SCHEMBL3481833 0.85 LTA4H (0.34) LTA4HTSHRNPSR1ALDH1A1
SCHEMBL14956699 0.83 MEN1 (0.30)
SCHEMBL706644 0.83 MEN1 (0.37) LTA4HTP53ALDH1A1KDM4EHPGD
SCHEMBL707030 0.83 TSHR (0.33) LTA4HTSHRTP53ALDH1A1KDM4E
SCHEMBL9496164 0.81 TP53 (0.36) LTA4HTP53ELANEESR1ESR2
SCHEMBL28010856 0.81
SCHEMBL28615429 0.80 MEN1 (0.42) TSHRELANEESR1ESR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
EP-3812428-B1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC IP MAN CO LTD (JP) 2025-12-03 EP disclosed
CN-119591871-A Phenylene boron hybridized silicon resin aerogel and preparation method thereof 哈尔滨工业大学 2025-03-11 CN disclosed
WO-2024176969-A1 METHOD FOR PRODUCING CARBONIC ACID DIESTER 国立研究開発法人産業技術総合研究所 2024-08-29 WO disclosed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN disclosed
CN-112424290-B Colloid structure, colloid multiple structure, and method for producing colloid structure 松下知识产权经营株式会社 2023-08-22 CN disclosed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN disclosed
US-11353642-B2 Optical filter, multiplex optical filter, and light emitting device and illumination system using the same PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2022-06-07 US disclosed
CN-114085382-A Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2022-02-25 CN disclosed
US-20210246330-A1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-08-12 US disclosed
US-20060269724-A1 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2006-11-30 US disclosed
EP-1690839-A1 FLEXIBLE SUBSTRATE AND COATING LIQUID Sumitomo Corporation (JP) 2006-08-16 EP disclosed
US-20050236985-A1 Flexible substrate and organic device using the same DAI NIPPON PRINTING CO., LTD. (JP) 2005-10-27 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed
EP-0384774-B1 Semiconductor device encapsulant TOSHIBA KK (JP) 1997-01-22 EP disclosed
US-5258426-A Semiconductor device encapsulant KABUSHIKI KAISHA TOSHIBA (JP) 1993-11-02 US disclosed
EP-0384774-A2 Semiconductor device encapsulant KABUSHIKI KAISHA TOSHIBA (JP) 1990-08-29 EP disclosed
US-4428776-A SEPARATORS OF CARBON DIOXIDE FROM METHANE THE STANDARD OIL COMPANY (US) 1984-01-31 US disclosed
EP-0097424-A2 Cellulosic semipermeable membranes THE STANDARD OIL COMPANY (US) 1984-01-04 EP disclosed