Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | LTA4H | P09960 | 3/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.30 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL710831 | 0.87 | ESR1 (0.37) | ESR1ESR2 | |
| SCHEMBL3482435 | 0.87 | TP53 (0.30) | CA4TP53 | |
| SCHEMBL3481598 | 0.84 | LTA4H (0.35) | TSHRLTA4HCYP1A2CYP2C19 | |
| SCHEMBL9496164 | 0.83 | TP53 (0.36) | CA4TP53ESR1ESR2LTA4H | |
| SCHEMBL14956282 | 0.82 | MEN1 (0.31) | — | |
| SCHEMBL703241 | 0.82 | TP53 (0.32) | CA4TP53ESR1ESR2TSHR | |
| SCHEMBL28624856 | 0.80 | MEN1 (0.43) | ESR1ESR2TSHRHSD17B10ELANE | |
| SCHEMBL14956602 | 0.80 | IDH1 (0.30) | — | |
| SCHEMBL533990 | 0.79 | LTA4H (0.34) | TP53ESR1ESR2TSHRLTA4H | |
| SCHEMBL16398526 | 0.79 | TP53 (0.33) | TP53ESR1ESR2LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| EP-3812428-B1 | COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE | PANASONIC IP MAN CO LTD (JP) | 2025-12-03 | — | — | EP | disclosed |
| CN-116323713-B | Curable composition and cured film | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| WO-2024181199-A1 | CURABLE COMPOSITION AND CURED FILM | 住友化学株式会社 | 2024-09-06 | — | — | WO | disclosed |
| WO-2024176969-A1 | METHOD FOR PRODUCING CARBONIC ACID DIESTER | 国立研究開発法人産業技術総合研究所 | 2024-08-29 | — | — | WO | disclosed |
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| CN-112424290-B | Colloid structure, colloid multiple structure, and method for producing colloid structure | 松下知识产权经营株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116323713-A | Curable composition and cured film | 住友化学株式会社 | 2023-06-23 | — | — | CN | disclosed |
| CN-116323698-A | Curable composition | 住友化学株式会社 | 2023-06-23 | — | — | CN | disclosed |
| CN-116323685-A | Curable composition | 住友化学株式会社 | 2023-06-23 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20070122631-A1 | Flexible substrate and coating liquid | SUMITOMO CORPORATION (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| EP-1690839-A1 | FLEXIBLE SUBSTRATE AND COATING LIQUID | Sumitomo Corporation (JP) | 2006-08-16 | — | — | EP | disclosed |
| CN-1809764-A | Antireflective film | ASAHI CHEMICAL IND (JP) | 2006-07-26 | — | — | CN | disclosed |
| US-20050236985-A1 | Flexible substrate and organic device using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |