SCHEMBL5352779

SCHEMBL5352779

CCCCOC(=O)OC1C2C=CC(C2)C1OC(=O)OCCCC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
ATM Q13315 1/20 0.39
TSHR P16473 4/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
AKT1 P31749 1/20 0.37
AKT2 P31751 1/20 0.37
AKT3 Q9Y243 1/20 0.37
HPGD P15428 2/20 0.37
ESR1 P03372 5/20 0.36
LMNA P02545 4/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C19 P33261 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
CYP2D6 P10635 1/20 0.36
MAPK1 P28482 1/20 0.36
NR1H2 P55055 1/20 0.36
RNASEL Q05823 1/20 0.36
HCAR2 Q8TDS4 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10881729 0.94 ALDH1A1 (0.44) ALDH1A1TSHRAKT1AKT2AKT3
SCHEMBL5354303 0.90 AKT1 (0.36) ALDH1A1TSHRTDP1AKT1AKT2
SCHEMBL5359043 0.82 ALDH1A1 (0.44) ALDH1A1ATMTSHRTDP1LMNA
SCHEMBL5367162 0.79 ALDH1A1 (0.40) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL5365496 0.78 ALDH1A1 (0.37) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL1451061 0.76 POLB (0.51) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL8691325 0.73 ALDH1A1 (0.48) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL2781725 0.72 SMN1; SMN2 (0.39) ALDH1A1TSHRHPGDLMNACYP1A2
SCHEMBL19323419 0.72 POLB (0.48) ALDH1A1ATML3MBTL1HPGDLMNA
SCHEMBL5836802 0.71 POLB (0.61) ALDH1A1TDP1LMNASMN1; SMN2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed