SCHEMBL5367162

SCHEMBL5367162

CCCCOC(=O)OCC1C2C=CC(C2)C1COC(=O)OCCCC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.40
ATM Q13315 1/20 0.38
TSHR P16473 4/20 0.37
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
HPGD P15428 2/20 0.36
ESR1 P03372 6/20 0.35
LMNA P02545 3/20 0.35
CYP1A2 P05177 2/20 0.35
CYP2C19 P33261 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CYP2D6 P10635 1/20 0.35
MAPK1 P28482 1/20 0.35
NR1H2 P55055 1/20 0.35
RNASEL Q05823 1/20 0.35
HCAR2 Q8TDS4 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2C9 P11712 1/20 0.34
PDE4D Q08499 1/20 0.34
ELANE P08246 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5349588 0.90 ALDH1A1 (0.33) ALDH1A1TSHRTDP1ESR1LMNA
SCHEMBL5360085 0.83 ALDH1A1 (0.48) ALDH1A1TSHRTDP1LMNACYP1A2
SCHEMBL5358599 0.79 KDM4E (0.38) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL5352779 0.79 ALDH1A1 (0.41) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL5352625 0.78 ALDH1A1 (0.39) ALDH1A1TSHRLMNACYP1A2CYP2C19
SCHEMBL1451061 0.75 POLB (0.51) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL37837 0.74 ALDH1A1 (0.67) ALDH1A1ATMTSHRTDP1L3MBTL1
SCHEMBL7230011 0.73 NLRP3 (0.41) ALDH1A1TDP1LMNACYP1A2CYP2C19
SCHEMBL30959771 0.73 NLRP3 (0.41) ALDH1A1TDP1LMNACYP1A2CYP2C19
SCHEMBL454418 0.73 NLRP3 (0.41) ALDH1A1TDP1LMNACYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed