SCHEMBL5359043

SCHEMBL5359043

CCOC(=O)OC1C2C=CC(C2)C1OC(=O)OCC

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.44
SOAT1 P35610 1/20 0.41
CYP2C19 P33261 4/20 0.41
CYP3A4 P08684 2/20 0.41
CYP1A2 P05177 1/20 0.41
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.36
TSHR P16473 1/20 0.36
POLB P06746 2/20 0.36
HTT P42858 1/20 0.34
CYP2C9 P11712 1/20 0.34
CASP6 P55212 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
ATM Q13315 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6379296 0.85 ALDH1A1 (0.35) ALDH1A1SOAT1CYP2C19CYP3A4CYP1A2
SCHEMBL5354303 0.85 AKT1 (0.36) ALDH1A1CYP2C19CYP3A4CYP1A2SMN1; SMN2
SCHEMBL5352779 0.82 ALDH1A1 (0.41) ALDH1A1CYP2C19CYP3A4CYP1A2SMN1; SMN2
SCHEMBL10881729 0.80 ALDH1A1 (0.44) ALDH1A1CYP3A4RAB9ATSHRLMNA
SCHEMBL2781725 0.78 SMN1; SMN2 (0.39) ALDH1A1CYP2C19CYP3A4CYP1A2SMN1; SMN2
SCHEMBL5360085 0.76 ALDH1A1 (0.48) ALDH1A1SOAT1CYP2C19CYP3A4CYP1A2
SCHEMBL5347727 0.75 ALDH1A1 (0.39) ALDH1A1SOAT1CYP2C19CYP3A4CYP1A2
SCHEMBL6432024 0.75 ALDH1A1 (0.41) ALDH1A1CYP3A4LMNA
SCHEMBL2781430 0.73 ALDH1A1 (0.44) ALDH1A1SOAT1CYP2C19CYP3A4TSHR
SCHEMBL16435698 0.73 HSD11B1 (0.48) ALDH1A1SOAT1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed
EP-0973786-A1 CATALYST AND USE OF CATALYSTS IN POLYMERISATION Ticona GmbH (DE) 2000-01-26 EP disclosed
WO-1998046614-A1 CATALYST AND USE OF CATALYSTS IN POLYMERISATION TICONA GMBH (DE) 1998-10-22 WO disclosed