Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
| ▸ | RNASEL | Q05823 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5359702 | 0.91 | KDM4E (0.39) | KDM4EALDH1A1POLBALOX15TDP1 | |
| SCHEMBL4401217 | 0.86 | KDM4E (0.39) | KDM4EALDH1A1POLBALOX15TSHR | |
| SCHEMBL14434848 | 0.86 | KDM4E (0.39) | KDM4EALDH1A1POLBALOX15TSHR | |
| SCHEMBL5358221 | 0.85 | ALDH1A1 (0.42) | KDM4EALDH1A1POLBALOX15TDP1 | |
| SCHEMBL21646820 | 0.85 | ALDH1A1 (0.42) | KDM4EALDH1A1POLBALOX15TDP1 | |
| SCHEMBL22263800 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1POLBALOX15ATM | |
| SCHEMBL12798523 | 0.81 | NLRP3 (0.40) | KDM4EALDH1A1EPHX2 | |
| SCHEMBL5349663 | 0.80 | KDM4E (0.39) | KDM4EALDH1A1POLBALOX15TDP1 | |
| SCHEMBL13714813 | 0.80 | NLRP3 (0.45) | TSHRMAPT | |
| SCHEMBL13996248 | 0.80 | NLRP3 (0.45) | TSHRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| EP-0885405-B1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | SUMITOMO BAKELITE CO (JP) | 2005-06-08 | — | — | EP | disclosed |
| US-6790579-B1 | PHOTOACID INITIATOR GENERATES ACID EFFECTING POLARITY CHANGE RENDERING POLYMER WATER SOLUBLE IN AREAS EXPOSED TO IMAGING SOURCE; INTEGRATED CIRCUITS, SEMICONDUCTORS | SUMITOMO BAKELITE CO., LTD. (JP) | 2004-09-14 | — | — | US | disclosed |
| US-6723486-B2 | POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST | SUMITOMO BAKELITE CO., LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-6482568-B1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-19 | — | — | US | disclosed |
| US-20020128408-A1 | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6232417-B1 | USING COORDINATION CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-15 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1021750-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| EP-1021477-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| WO-1999014256-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |
| WO-1999014635-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |
| EP-0885405-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1998-12-23 | — | — | EP | disclosed |
| WO-1997033198-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1997-09-12 | — | — | WO | disclosed |