SCHEMBL5359702

SCHEMBL5359702

CCCOC(=O)OCC1CC2C=CC1C2

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 10/20 0.39
ALDH1A1 P00352 5/20 0.39
POLB P06746 1/20 0.34
ALOX15 P16050 1/20 0.34
TDP1 Q9NUW8 2/20 0.33
LMNA P02545 2/20 0.33
MAPT P10636 2/20 0.32
PKM P14618 2/20 0.32
MAPK1 P28482 1/20 0.32
EPHX2 P34913 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5358599 0.91 KDM4E (0.38) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL14434848 0.89 KDM4E (0.39) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL4401217 0.89 KDM4E (0.39) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL5358221 0.88 ALDH1A1 (0.42) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL21646820 0.88 ALDH1A1 (0.42) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL5349663 0.83 KDM4E (0.39) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL4403485 0.81 KDM4E (0.35) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL14449086 0.81 KDM4E (0.35) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL455925 0.80 NLRP3 (0.43) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL4739740 0.80 KDM4E (0.40) KDM4EALDH1A1POLBALOX15TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed