SCHEMBL5360085

SCHEMBL5360085

CCOC(=O)OCC1C2C=CC(C2)C1COC(=O)OCC

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.48
CYP2C19 P33261 6/20 0.40
CYP3A4 P08684 5/20 0.40
SOAT1 P35610 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2C9 P11712 2/20 0.36
RAB9A P51151 1/20 0.36
TSHR P16473 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
POLB P06746 2/20 0.35
HSD17B10 Q99714 2/20 0.34
MAPK1 P28482 1/20 0.34
CASP6 P55212 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
HTT P42858 1/20 0.33
MAPT P10636 2/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5349588 0.86 ALDH1A1 (0.33) ALDH1A1CYP2C19CYP3A4CYP1A2TSHR
SCHEMBL5352625 0.83 ALDH1A1 (0.39) ALDH1A1CYP2C19CYP3A4CYP1A2RAB9A
SCHEMBL5367162 0.83 ALDH1A1 (0.40) ALDH1A1CYP2C19CYP3A4CYP1A2CYP2C9
SCHEMBL7230011 0.79 NLRP3 (0.41) ALDH1A1CYP2C19CYP3A4CYP1A2SMN1; SMN2
SCHEMBL30959771 0.79 NLRP3 (0.41) ALDH1A1CYP2C19CYP3A4CYP1A2SMN1; SMN2
SCHEMBL454418 0.79 NLRP3 (0.41) ALDH1A1CYP2C19CYP3A4CYP1A2SMN1; SMN2
SCHEMBL13346537 0.76 NLRP3 (0.37) ALDH1A1CYP2C19CYP3A4CYP1A2RAB9A
SCHEMBL21646820 0.76 ALDH1A1 (0.42) ALDH1A1CYP2C19CYP3A4SOAT1CYP1A2
SCHEMBL5358221 0.76 ALDH1A1 (0.42) ALDH1A1CYP2C19CYP3A4SOAT1CYP1A2
SCHEMBL5359043 0.76 ALDH1A1 (0.44) ALDH1A1CYP2C19CYP3A4SOAT1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed